[labnetwork] Help with Silicon on Sapphire

[Everly, Richard]

I have researcher that wants to grow a thermal oxide on 6000Ang epi layer on sapphire substrate. I have no experience with this material and the documentation seems to be scarce. I don't want to burn up the substrate by doing something foolish as they very expensive. any help would be greatly appreciated!

1. is this material process compatible with standard silicon processes, can I use the same tube as I do my regular dry oxidation and not worry about contamination.

2. What heat-up and cool-down rates should I use, and are there any temp limits I need to be aware of? I've read that thermal expansion can be a problem.

3. Can I use the RCA clean process? I'm worried about the SC1 solution attacking the Sapphire.


Richard Everly
Cleanroom Engineer
Nanotechnology Research and Education Center (NREC)
University of South Florida
NREC, ENB118
4202 E. Fowler Ave.
Tampa, FL 33620

Office: 813-974-5365
Fax:    813-974-3610