[labnetwork] RH question

[Paolini, Steven]

Rick, 45% is on the low side but not unusual. Operating an area with lower RH can invite static problems. Operating in the mid to high 50% range will affect resists, it actually absorbs water and changes the photo speed. Here at Harvard CNS, we maintain 45% with a tolerance of +/_  3%.
 If you plan on installing steppers, Check with the manufacturer to see where the machine will be "happy" . In any event, emphasis must be put into control tolerance. In order to get consistent processes, you need a consistent environment.
Feel free to come over and look at our clean room, your just down the street and I could give you a tour.
Regards,

Steve Paolini
Principal Equipment Engineer
Harvard University Center for Nanoscale Systems
11 Oxford St. Cambridge MA 02138
Tel. 617 496 9816
spaolini at cns.fas.harvard.edu

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr.
Sent: Tuesday, August 02, 2011 11:49 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] RH question

Hi Everyone,

Draper Laboratory is in the design phase for a new 6,000 sqft cleanroom. We are lucky enough to have a chance to have a Class 10 photolithography area. My question is what are others using for a humidity spec for the photolithography area, we are thinking 45% +-3%. This is based on research done by Dave Carter here at Draper.

Any thoughts?

Rick




Rick Morrison
Senior Member Technical  Staff
Acting Group Leader Mems Fabrication
Draper Laboratory
555 Technology Square
Cambridge, MA  02139

617-258-3420

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