[labnetwork] Piranha & HF no rinse protocols

[Errol V. Porter]

Greetings,

I am trying to get a consensus and feedback from the group on a wet etch process using 1st H2SO4:H2O2 (1:1) and 2nd HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice in some special circumstances, what safeguards to you put in place to protect the users.

Regards,

Errol Porter
University of Arkansas / HiDEC
700 W. Research Center Blvd
Fayetteville, AR 72701
Tel. (479) 575-2519
Mobile: (479) 236-0693
Fax (479) 575-2719
email: evporte at uark.edu<mailto:evporte at uark.edu>
http://www.hidec.uark.edu<http://www.hidec.uark.edu/>

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