[labnetwork] Metamaterials deposition - Ag and SiO2

[Fouad Karouta]

Dear Esta,

I agree with Aimee as you don't want to introduce oxygen in an e-beam evaporator dedicated for metals.

As to the SiO2/Ag stack I believe this can be done in a sputter system if the system can have both metals and oxides. We do have a sputter system we use for all types of materials.

Regards, Fouad

*************************************
Manager ANFF ACT Node
Australian National Fabrication Facility
Research School of Physics and Engineering
L. Huxley Building (#56), Mills Road, Room 4.02
Australian National University
ACT 0200, Canberra, Australia
Tel: + 61 2 6125 7174
Mob: + 61 451 046 412
Email: fouad.karouta at anu.edu.au<mailto:fouad.karouta at anu.edu.au>
http://anff-act.anu.edu.au/

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Price, Aimee
Sent: Tuesday, 1 August 2017 11:47 PM
To: Abelev, Esta <eabelev at pitt.edu>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Metamaterials deposition - Ag and SiO2

Esta,
We have not, to my knowledge, done multilayer stacks.  However, we do evaporate SiO2 in our "multi-use" ebeam evaporator but not in the one we use for metal contacts.  We use a different quartz crystal monitor for SiO2 and Hafnium oxide than we do for metals.  We have found that using separate crystals works best to maintain proper z-ratios for both.

I've copied our lab manager who has worked extensively on this.

Aimee

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Abelev, Esta
Sent: Monday, July 31, 2017 8:10 PM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Metamaterials deposition - Ag and SiO2

Dear Colleagues,

Recently, we got a request to deposit SiO2 and Ag in our e-beam evaporator. We have only one e-beam UHV evaporator (brand new) which we planned to dedicate for metals (only). From what was discussed the group is planning to deposit alternative layers of SiO2 and Ag (10-20nm thick) to ~1micron thick overall thickness.
Did anyone have experience with similar multilayer structures, would you advise me if e-beam evaporation or sputtering would better for this project?
If we will have to go with evaporation of SiO2, will it have contamination issues with metal deposition?

Thanks for advice, Esta

-----------------------
Esta Abelev, PhD
Technical Director, Petersen Institute of NanoScience and Engineering
University of Pittsburgh | 3700 O'Hara Street | 636| Pittsburgh, PA 15261
412-383-4096 | eabelev at pitt.edu<mailto:eabelev at pitt.edu> | nano.pitt.edu<https://na01.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.nano.pitt.edu%2F&data=01%7C01%7Ceabelev%40pitt.edu%7C9f5bd58ba84940765cf308d4024fbe18%7C9ef9f489e0a04eeb87cc3a526112fd0d%7C1&sdata=3KfbG5VbshqdoIAPxvX%2F2s1UeU7ultmBoZmm%2FaZ2Itc%3D&reserved=0>


-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20170801/4e223646/attachment.html>