[labnetwork] Looking for cleaning advice - post wire-saw - removing slurry from wafers

[Morrison, Richard H., Jr]

Hi,

We use a modified mask cleaner sold by Ultra-T (California company). It uses a high pressure water jet that scans across a moving wafer it knocks of debris. We alos have a single wafer/mask cleaner that uses RCA type chemicals and brushes to clean photo mask. I bet a snow clean (air blast with CO2 ice) might work, you get purchases automated snow clean tools.

Ultra T web site is   http://www.ultrat.com/index.html
Mask cleaner is sold by Hamatech   now owned by Suss Microtech
Snow cleaners   http://www.cryosnow.com/index.php/en/Products/


Rick


Richard H. Morrison
Principal Member of the Technical Staff
Draper
555 Technology Square
Cambridge, MA
02139-3573

Work  617-258-3420
Cell  508-930-3461
www.draper.com<http://www.draper.com>



From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Gavin, Frank
Sent: Tuesday, August 15, 2017 5:11 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Looking for cleaning advice - post wire-saw - removing slurry from wafers

I am looking for a process to clean post wire sawing Silicon Carbide substrates.  The material being cleaning is SiC substrates and the abrasive that needs to be removed is a synthetic glycol based fluid mixed with diamond powder.  During the wire sawing process there is also kerf from the SiC as well as the steel cord wire that abrades as well.  It is a very aggressive process and heavy solids need to be removed.  Operators are spending the day hand wiping wafers.  Any advice is welcomed.

Best Regards,
FRANK GAVIN, Sales Eng.
[WaFab_Logo200px]<http://www.wafabintl.com/>
6161 Industrial Way, Livermore CA 94551
(925) 455-5252 ext 2420  Fax: (925) 455-5351



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