[labnetwork] PDS 2010 Labcoter 2 - Contamination Control

[Tony L Olsen]

Norman

As we moved into our new cleanroom facility a few years ago, this was a topic of discussion.  Without question, the system does generate a lot of particles, both during a system/chamber clean and cleaning the thimble or cold finger after each cycle.  Although many wanted the tool in the cleanroom and there are ways to reduce the impact of the particles, we decided to install the tool in a room adjacent to the cleanroom.  We considered an isolated Class 10000 room in the cleanroom, a tent, a snorkel, and other options, but were not comfortable that any option would prevent migration of particles onto cleanroom clothing and into the rest of the cleanroom.  Since we made that decision, it has proved convenient for those lab members who only use the facility to deposit parylene and do not need full cleanroom access and safety training.  Also, a user does not need to gown up every time they want to check the status of their process cycle.

Although it is not yet active, we have placed a portable ULPA fan filter unit above the coater, believing it may resolve potential concerns about particles in the immediate workspace.

Also, we do not allow oil-based pumps in our new facility.  We made some minor modifications and switched to an Edwards nXDS15i dry scroll pump.  This is the primary scroll pump we use in our facility with spares and rebuild kits on-hand.  It has worked well.

tonyO


Tony Olsen
Nanofab Cleanroom Supervisor/Process Engineer
University of Utah
36 S Wasatch Dr, Suite 2500
Salt Lake City,  UT  84112
801-587-0651 office
801-587-3077 fax
www.nanofab.utah.edu<http://www.nanofab.utah.edu/>




From: Norman Gottron [mailto:ngottron at andrew.cmu.edu]
Sent: Tuesday, January 10, 2017 12:10
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] PDS 2010 Labcoter 2 - Contamination Control

Hello All,

We are looking to relocate our SCS parylene deposition (PDS 2010 Labcoter 2) system to our new cleanroom facility, and it seems wise to consider contamination control in placing this tool.  I know that the use of these tools is relatively widespread, and I am wondering how others handle the particles/parylene flakes that are released when the tool is cleaned and maintained.  We recently experienced an uptick in use on the tool and began running thicker deposition (on the scale of microns for each deposition), both of which have contributed to particle concerns in the area around the tool.  Most of the particle concerns are a result of cleaning the cold trap probe (indicating there may be a better way to do this), but we've had to recently tear into the system and unclog the vaporizer line, which also is a pretty dirty process.

In particular, can anyone comment on the following?

  *   Is your system located in clean space?  If so, what is the class designation of its location?
  *   How do you mitigate the risk of particle release during tool maintenance/cleaning?

Thanks!


Norman Gottron
Process Engineer, Carnegie Mellon University Nanofabrication Facility
Electrical and Computer Engineering | Carnegie Mellon University
5000 Forbes Ave
Pittsburgh, PA 15213
Phone: 412-268-4205
Fax: 412-268-3497
www.ece.cmu.edu<http://www.ece.cmu.edu/>
www.nanofab.ece.cmu.edu<http://www.nanofab.ece.cmu.edu/>



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