[labnetwork] Raith vs. Elionix E-beam writers

[Brent Gila]

Hello Kevin,

We have had a Raith 150 system at UF for many years now and the tool 
works very well.  I am not familiar with the Elionix line of tools, but 
I can vouch for the Raith systems and their support.  We are currently 
working on a rectenna project that has CDs that are tighter than what 
you have listed and it has no issue in creating this pattern over large 
areas.

As with ANY ebeam litho system, what is very important is the proper 
dose arrays when determining the exposure routine and more importantly, 
the proximity corrections for highly dense arrays or lines.  I have met 
several researchers who have not done sufficient proximity correction 
(or any at all) and simply complain that the tool does not function 
properly.  It would be a good idea to include proximity correction 
software as a part of the purchase if it is not already included with 
the instrument.  There are some excellent 3rd party software packages 
that can be added for proximity correction, but be prepared as they are 
not cheap.

Best Regards,
Brent
-- 
Brent P. Gila, PhD.
Director, Nanoscale Research Facility
1041 Center Drive
University of Florida
Gainesville, Florida 32611
Tel:352-273-2245
Fax:352-846-2877
email:bgila at ufl.edu



On 10/3/2017 7:50 AM, Kevin McPeak wrote:
> Dear Colleagues,
>
> My colleagues at Tulane University and I recently were awarded an NSF
> MRI grant for an E-beam lithography system. We are currently looking
> at two different suppliers for this system, Raith and Elionix. For
> Raith we are looking at their Voyager100 (50 kV) and E-Line Plus (30
> kV) systems and for Elionix we are looking at their latest ELS-S50EX
> (50 kV) model. All three systems have been placed within our budget.
>
> Our group of e-beam writers is interested in achieving both large
> single field sizes of periodic arrays of nanostructures (e.g. ~200 nm
> features over 500 um x 500 um region) and excellent stitching accuracy
> for writing 5 mm x 5 mm arrays of nanostructures.
>
> I would appreciate any input you have on using Raith and Elionix
> systems for high-performance e-beam writing (i.e. custom support,
> usability, uptime, etc.)
>
> Thank you.
>
> Regards,
> Kevin
>