[labnetwork] STS Multiplex DRIE

[proma016 at fiu.edu]

Greetings labnetwork

Can someone recommend an FSE for starup and service of an early model STS DRIE bosch process Si etcher?

Sent from my iPhone

> On Jul 26, 2018, at 10:06 PM, Paolini, Steven <spaolini at cns.fas.harvard.edu> wrote:
> 
> Both are great systems. We like our Oxford Cobra ICP so much that we bought its sister system in ICPCVD. We have a Plasmatherm Versaline system that runs flawlessly as well. In my 35 years of experience, these systems Represent the best in class for university work.
> I can’t think of any cons with either platform.
>  
> Steve Paolini
> Equipment Dood
> Harvard University Center for Nanoscale Systems.
>  
> Steve Paolini
> Principal Equipment Engineer
> Harvard University Center for Nanoscale Systems
> 11 Oxford St.
> Cambridge, MA 02138
> 617- 496- 9816
> spaolini at cns.fas.harvard.edu
> www.cns.fas.harvard.edu
>  
> From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Chen, Jun
> Sent: Thursday, July 26, 2018 12:51 PM
> To: labnetwork at mtl.mit.edu
> Subject: [labnetwork] Experience on ICP-RIE
>  
> Dear Colleagues,
> We plan to purchase two ICP-RIE systems(Chlorine and Fluorine) recently. Currently we get quote from Oxford Instruments PlasmaPro 100 Cobra300 and  Plasma-Therm Apex SLR ICP.
> Does anyone have experience on these systems? What’s the pros and cons?  I would greatly appreciate for your feedback!
>  
> best,
> 
> Jun Chen, Ph.D.
> Nanofabrication scientist,
> Petersen Institute of NanoScience and Engineering, and Department of Electrical and Computer Engineering | University of Pittsburgh
> 3700 O'Hara Street, Pittsburgh, PA 15261
> T: 412.383.3282
> http://www.nano.pitt.edu/
>  
>  
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