[labnetwork] Phosphorous doping methods

[Goodman, James R]

Iulian,

I have used both in years past in a manufacturing environment. POCl3 can be an issue for handling and storage. The solid wafer type of Phosphorus sources are more cumbersome but safer in my mind.

Jay.

-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu
Sent: Friday, September 14, 2018 11:25 AM
To: Fab Network <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Phosphorous doping methods

Dear All,

I am working on providing phosphorous doping capability at a tube furnace that will be used for fabrication classes (the first class will make a solar cell).

My research to date uncovered POCl3 and solid sources as possible methods for P diffusion. As expected, each seems to come with benefits and drawbacks.

I am hoping that you are willing to share your experience/advcie with me and/or the group so I can make a quick and smart decision.

Thank you very much,

Iulian

--
iulian Codreanu, Ph.D.
Director of Operations, UD NanoFab
163 ISE Lab
221 Academy Street
Newark, DE 19716
302-831-2784
http://udnf.udel.edu


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork