[labnetwork] ALD process for ZnO?

[Hollingshead, David]

Hi Tim,

We regularly run ZnO films on our Picosun SunALE 150-R. We have two "standard" processes, one at 150° and one at 110°, both of which run well. I expect you could drop the temp down further if needed. These both use DEZn and H2O as sources. In addition to the standard ZnO film, we have done some limited work on Al-doped ZnO.

Lower temperature depositions will almost certainly require longer pulse and purge times. For example, our 150° process runs at 0.1 sec pulse / 4 sec purge, while the 110° process is 0.5 sec / 8 sec. We also saw a slight reduction in growth rate from 1.7 Å/cycle @ 150° to 1.58 Å/cycle @ 110°.

If you have any questions, don't hesitate to reach out.

-Dave

Dave Hollingshead 
Senior Research Associate – Nanotech West Lab
The Ohio State University
Suite 100, 1381 Kinnear Road, Columbus, OH 43212
614.292.1355 Office
hollingshead.19 at osu.edu osu.edu

-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Tim Gilheart
Sent: Wednesday, August 21, 2019 14:50
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] ALD process for ZnO?

Greetings all,

We’re working with some of our users who may need to explore ZnO deposition, ideally at lower temperatures (100 C or less). 

We’re not equipped to do this on any of our PVD systems without inviting other problems, but we understand that several teams on this list have reported accomplishing this via ALD.

If anyone has suggestions, process notes, and/or cautionary tales, we’d appreciate hearing your perspective.

Thanks,

--
Tim Gilheart, Ph.D.
Research Scientist - Nanofabrication Cleanroom Manager, Shared Equipment Authority (SEA), Rice University
Office: 713-348-3159 | gilheart at rice.edu


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