[labnetwork] Has anyone using thicker than 200nm HSQ for EBL patterning?

[Mark K Mondol]

As usual I agree with Mike, but have to chime in anyway. Applied Quantum Materials in Canada offers dry HSQ, which you mix with MIBK to make a solution. I just got some and haven't used it yet, but others have. As it is dry you can make whatever dilution you want to achieve thicker films.
________________________________
From: labnetwork-bounces at mtl.mit.edu [labnetwork-bounces at mtl.mit.edu] on behalf of Michael Rooks [michael.rooks at yale.edu]
Sent: Saturday, March 09, 2019 8:50 AM
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Has anyone using thicker than 200nm HSQ for EBL patterning?



Multiple-spins seldom produce good results. It's easier to use a thicker solution of HSQ. Of course you can buy thicker HSQ, such as Fox-16, but if you are in a hurry you can thicken the 6% HSQ (well, any resist really) by bubbling nitrogen through it. Just put a tube in the bottle and blow in some dry nitrogen. The solvent will evaporate, and the bubbles will keep the solution agitated, so a skin does not form on the surface. No need to be precise about the solution. Just keep bubbling until you get the thickness you want.


------------------------------------
Michael Rooks
Yale Institute for Nanoscience and Quantum Engineering
nano.yale.edu


On 3/8/2019 10:02 PM, Zhao, Mengdi wrote:

Hello everyone,


I am trying to spin 350nm HSQ by double coating XR1541 6% at 2000rpm and bake at 80C between coating. However, HSQ thickness measured by reflectance spectrum actually get thinner after the second spin and bake. I wonder if the HSQ still get dissolved again during the 2nd dispense even with 80C bake for 4min after the first coating. Any suggestion on getting over 200nm HSQ spin coated on Si?


Best regards,


Mengdi




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