[labnetwork] Etching GaP with PhotoResist as a etch stop

[Sa'ad H]

I'm currently working on a process to etch GaP in BCl3. I know Zep works as an etch stop for BCl3, but I want to move away from Zep so I can use optical litho instead of ebeam. Does anyone know if standard photoresists (s1805) or SPR-220 (these are just examples) would work as etch stops?

Alternately, are there any hard masks or oxides that anyone could suggest?
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