[labnetwork] ALD availability in the midwest

[Shepard, Jeremiah J]

All,
Thank you very much for your fast replies and support!

To those who have offered to help, I will make your contact information available to our researchers internally and recommend they reach out to you individually with their specific needs.

Thank you again!
Jerry Shepard
________________________________
From: Tony L Olsen <tony.olsen at utah.edu>
Sent: Monday, August 10, 2020 3:49 PM
To: Shepard, Jeremiah J <jshepar at purdue.edu>; labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: RE: ALD availability in the midwest


Jerry



I’m a little further away, but I have a Cambridge Fiji200 with each of these films as standard processes.  I’m certainly willing to help.



tonyO





Tony Olsen

Nanofab Cleanroom Supervisor/Process Engineer

University of Utah

36 S Wasatch Drive, Suite 2500

Salt Lake City, UT  84112

801-587-0651

www.nanofab.utah.edu







From: Shepard, Jeremiah J <jshepar at purdue.edu>
Sent: Monday, August 10, 2020 07:04
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] ALD availability in the midwest



All,

Good morning!  I am an engineer with Purdue's Birck Nanotechnology fab.  Our ALD system has went down and will be down for several weeks.  I am looking for alternatives for our researchers to use until our system comes back online.  We are located in West Lafayette, Indiana and options would need to be within a few hours driving distance of our location, or provide the service through mail.



Our system is equipped with AlOx, HfOx,  and SiOx.  The majority of our users are growing AlOx and HfOx.  We have many users interested in low temp growths at 90 to 110 C and we have a limit of 50 nm film thickness.  We also have many users growing at more traditional 200 C temps.  I would expect work coming from our fab to fall within these parameters.



Any leads would be greatly appreciated!



Thank you,

Jerry Shepard


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