[labnetwork] Low-Stress silicon nitride via LPCVD capability

[Price, Aimee]

Hi Bill,
We have an LPCVD nitride process (Ohio State) that meets those specs.  That process hasn’t been run in a while, generally we run our stoichiometric nitride more often than the low stress.  However the furnace is capable of it.  There may be a bit of process testing/verification needed ahead of any real product run.

I’m happy to speak to your customer as appropriate.

Best,
Aimee Bross Price

Sr. Research Associate
The Ohio State University
Nanotech West Lab
Institute for Materials Research
1381 Kinnear Road
Suite 100
Columbus, OH 43212
614-292-2753





From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Bill Kiether
Sent: Friday, February 19, 2021 9:30 AM
To: labnetwork at mtl.mit.edu
Cc: Philip Barletta <pbarlet at ncsu.edu>
Subject: [labnetwork] Low-Stress silicon nitride via LPCVD capability

Hello all,

We have a customer that needs some specific capabilities for low stress Silicon Nitride that we can't provide right now. Does anyone have a well established process that can reach these values. The specs are:

4" wafers
Target thicknesses are 500A and 1500A,
with stress 200MPa +/- 50 and refractive index 2.15 +/- 0.05

Please send me your contact info and I will pass it along.
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