[labnetwork] Resist developer etching time for ALD films

Dilek Cakiroglu (Alumni) dcakiroglu at alumni.sabanciuniv.edu
Sun Nov 12 10:57:59 EST 2023

Previous message (by thread): [labnetwork] PECVD with SiH4 concentration of 4% or less?
Next message (by thread): [labnetwork] Sputtering TaP
Messages sorted by: [ date ] [ thread ] [ subject ] [ author ]

Hi ,

Does anyone have experience with resist developer etching time for ALD
films? My primary interest is Al2O3, SiO2, HfO2 and SiN ALD films.

Regards,

Dilek
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20231112/fd908b27/attachment.html>

Previous message (by thread): [labnetwork] PECVD with SiH4 concentration of 4% or less?
Next message (by thread): [labnetwork] Sputtering TaP
Messages sorted by: [ date ] [ thread ] [ subject ] [ author ]

More information about the labnetwork mailing list