[labnetwork] HBr and Cl2 mixing gases

[MINGWEI LIN]

Hi, Everyone:
We are going to purchase a new metal etcher with Cl-based and HBr gases. Can anyone share the experience of HBr and Cl-based mixing gases for the etcher?
1. Can the HBr and Cl2 mixing gases be used together for the Si/Poly Si etch? If Cl2 was used first followed by HBr, would any cleaning be necessary in between?
2. Does anyone know about any impact on III-V materials (GaN for example) etch or device performance if HBr and Cl2/BCl3 are used in the chamber?
3. If there is cross contamination issue about the mixing gases, what about the cleaning criteria if we switch HBr and Cl-based gases back and forth? Any better way for the tool management?
Thanks/regards,

MINGWEI LIN, PhD
Process Engineer
Nanoscale Fabrication Center
University of Wisconsin-Madison

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