[labnetwork] low temperature ALD deposition

[Abelev, Esta]

Dear Colleagues,

A group at our University is trying to deposit HfO2 at low temperatures (80C and 100C) by ALD techniques.
Currently, the group is using our Fiji200 instrument located in share user cleanroom, unfortunately we have seen a lot of particulates after those depositions, specially if the following user will deposit films at much higher temperatures like 250C.


  1.  If anyone has an experience of low temp ALD depositions and can advise on process conditions or some cleaning procedures, we can implement to reduce post low temp particles. Please advice.
  2.  Parallel we are looking potentially purchasing a dedicated instrument for low temp ALD deposition, if someone has an advice on the instrument, please do? We were suggested maybe to go with ANRIC Technologies tabletop unit, is someone familiar with this vendor and their systems?

Best, Esta

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