[labnetwork] Diamond Etching

[Demis D. John]

Emma,
I know some of our users run Cl2/O2 etches of Diamond, hours-long to get
through ~50-100µm or so if I remember correctly.  No contaminations as far
as I know.  We've even run it on our III-V etcher (just a few times) and
not had any obvious process issues.
https://wiki.nanofab.ucsb.edu/wiki/Process_Group_-_Process_Control_Data#Oxford_PlasmaPro_Cobra_Etcher

Probably Ania Jayich's group at UCSB has some papers about this.
-- Demis (contact info <https://wiki.nanotech.ucsb.edu/wiki/Demis_D._John>)
*Reminder*: The NanoFab has a publications policy
<https://wiki.nanotech.ucsb.edu/wiki/Frequently_Asked_Questions#Publications_acknowledging_the_Nanofab>


On Wed, Jul 31, 2024 at 1:07 PM Emma Anquillare <eanquillare at gc.cuny.edu>
wrote:

> Hello Lab network!
>
> We have a user that is interested in etching a CVD grown slab of Diamond
> (Area: 3mmx3mm) about ~300 um thick via CF4/O2 or SF6 plasma (CF4 process
> described here-
>  https://www.sciencedirect.com/science/article/abs/pii/S0925963501006173
> <https://urldefense.com/v3/__https://www.sciencedirect.com/science/article/abs/pii/S0925963501006173__;!!GekbXoL5ynDpFgM!WxaE7hfA6-iCIfo3iRBj8F1Agt1XD-R1rG2Erff2xgbqNr8azLuLPVme0Bu1-MPWWvbxOATSjMfwV6cW23nVbunPXr7k$> ,
> though they would use a SiO2/ PMMA instead of Al mask and an ICP instead of
> an RIE).
>
> Here is what I have read on diamond so far:
> There is no precedent category for Carbon or diamond in the Cornell CNF
> materials categories (though SiC was allowed in even the most restricted
> tools) or in labnetwork. The sputter yield should be very low (~0.2 with Xe
> at 750ev- though most of the other values we have for comparison were with
> Ar at 600eV) and I could not find a vapor pressure curve for it. MP/BP at
> atmosphere is absurdly high (in the thousands) and I don't think the etch
> temperature would be hot enough for it to degrade to graphite. (Actually- I
> don't even know if our etcher will get hot enough to prompt the fluorine
> reaction based on literature, but apparently it has been etched before.)
> Not a toxic material. We might get HF vapor as a side product but usually
> figure scrubbers can handle that without further risk or precautions.
>
> Do any facilities out there have experience plasma etching CVD diamond?
> What level-of-cleanliness tool did you allow it in? Were there any
> contamination problems (especially relevant to waveguides) or other safety
> aspects I should be aware of? What cleaning recipe did you use?
>
> Thanks,
> Emma
>
>
>
>
>
>
>
>
>
> *_____________________________________________*
> *Emma Anquillare, PhD*
> Research Scientist
> ASRC Nanofabrication Facility
> City University of New York
>
> *Catalyzing Change, Celebrating Gains: *
> *A decade of visionary science for the public good.*
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20240731/e7c11adc/attachment.html>
-------------- next part --------------
A non-text attachment was scrubbed...
Name: Outlook-1t1zxbk1.jpg
Type: image/jpeg
Size: 141606 bytes
Desc: not available
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20240731/e7c11adc/attachment.jpg>