[labnetwork] Ebeam evaporation - arcing between features

[Roberto R. Panepucci]

Hi Bob, 

First suggestion is to use one of the conducting spin-on layers, such as Discharge or ESpacer, (or home-made versions of these). 

Second suggestion, based on the fact that you do not appear to see these lines after developing, is that you do a step to remove stress from the developed resist, perhaps a post-development bake, as it could be cracking during the evaporation. 

Best, 
Roberto Panepucci 
panepucci at cnf.cornell.edu 

----- Em 21 de Maio de 2024, em 16:48, Geil, Bob <bob.geil at unc.edu> escreveu: 

> Hello labnetwork,

> I have a user that is fabricating some electrodes and has observed what appears
> to be arcing between the sharp points of the electrodes. Imagine features like
> this: > < where the distance between them is 2um - 8um. The substrate is
> quartz. Fabrication approach is 1) ebeam lithography 2) ebeam evaporation and
> 3) lift-off.

> After EBL development, the electrode circuit is open, as intended
> After evaporation +lift-off, there is a line about few 100nms wide that is
> shorting the electrodes: >-<
> There is not a short between the electrodes with the 8um gap, however, there are
> some metal lines extending from the two sides: >- -<

> All of this suggests that arcing is occurring. Has anyone observed this before
> and can you suggest ways to get around it?

> Thanks,
> Bob

> Bob Geil, PhD
> Technical Director • CHANL
> Dept. of Chemistry • UNC-CH
> Chapel Hill, NC

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