[labnetwork] litho spin developer

[Iulian Codreanu]

Dear colleagues,

When we started the cleanroom at UDel we worked with CEE to develop a 
developing station based on their spinners. It was a lot cheaper than 
the figure Yong mentioned.  It has sat largely unused because the vast 
majority of our users work with small pieces.

iulian Codreanu, Ph.D.
Director, Nanofabrication Facility
University of Delaware
Harker ISE Lab, Room 163
221 Academy Street
Newark, DE 19716
302-831-2784
https://udnf.udel.edu


On 4/15/2026 4:44 PM, Sun, Yong wrote:
> Hi Kurt,
>
> I would add a few points here following Garry’s excellent advice:
> (1). CNF had the luxury of acquiring the robust Auto Spin Develop 
> systems, which were designed for production. If you don’t have the big 
> budget (>>$100k per system), a cheaper auto spin develop system can 
> add a lot more maintenance work for the tool manager. This is the 
> common drawback of a cheap auto spin develop systems not mentioned in 
> Garry’s post.
> (2). If you have a lot more users working with small chips, the 
> benefit of an auto spin develop system is also not obvious, as users 
> have to use a carrier wafer every time, which can be painful to prepare.
> (3) The advantages of an auto spin develop system will only shine when 
> most of your users do the majority of their fabrication on standard 
> size wafers (e.g. 4”, 6” or 8”). Comparing to manual developing 
> procedures, the consistency of the auto spin develop system is simply 
> amazing.
>
> For advanced lithography using steppers, it’s also recommended that 
> the cleanroom facility should be equipped with some automated systems, 
> such as the auto spin develop system, auto spin rinse system, auto 
> spin etch system…etc. When throughput, consistency, uniformity are 
> required for your applications, such automated systems will deliver 
> the magic.
>
> Best,
> Yong Sun
>
> ------------------------------------------------------------------------
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Garry 
> J. Bordonaro <bordonaro at cnf.cornell.edu>
> *Sent:* Wednesday, April 15, 2026 11:37 AM
> *To:* 'Kurt Kupcho' <kurt.kupcho at wisc.edu>; labnetwork at mtl.mit.edu 
> <labnetwork at mtl.mit.edu>
> *Subject:* Re: [labnetwork] litho spin developer
>
> Kurt,
>
> We have been using automated developers for over 20 years. The 
> advantages are **reproducibility**, reduced chemical usage, reduced 
> glassware usage.
>
> The only disadvantage for us is maintenance, although that is 
> generally quite low.  You may have issues with chemical disposal 
> depending on your local rules and the particular equipment you use.  
> Piece work can be done with some effort and special chucks.
>
> Users like them as they get better and more consistent results, and do 
> not have to deal with pouring chemicals and glassware.
>
> The tools can be expensive.  We got ours during the 2000 bubble crash 
> auctions.
>
> Garry J. Bordonaro
>
> Microlithographic Engineer
>
> Cornell NanoScale Facility
>
> 250 Duffield Hall
>
> 343 Campus Road
>
> Ithaca NY 14853-2700
>
> (607) 254-4936
>
> bordonaro at cnf.cornell.edu <mailto:bordonaro at cnf.cornell.edu>
>
> http://www.cnf.cornell.edu/ <http://www.cnf.cornell.edu/>
>
> Please acknowledge CNF in your publications:
>
> "This work was performed in part at the Cornell NanoScale Science & 
> Technology Facility (CNF), a member of the National Nanotechnology 
> Coordinated Infrastructure (NNCI), which is supported by the National 
> Science Foundation (Grant NNCI-2025233)."
>
> *From:*labnetwork <labnetwork-bounces at mtl.mit.edu> *On Behalf Of *Kurt 
> Kupcho
> *Sent:* Tuesday, April 14, 2026 10:25 AM
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] litho spin developer
>
> Hi all
>
> I was wondering who out there has litho spin developers vs. doing 
> litho development manually with dishes.
>
> Do you users/students like the spin developer?
>
> Advantages and disadvantages of the spin developer?
>
> Any opinions and guidance would be much appreciated!
>
> Thank you
>
> Kurt
>
> Kurt Kupcho
>
> Materials Science Engineer
>
> Nanoscale Fabrication Center (NFC)
>
> University of Wisconsin
>
> 1550 Engineering Dr.
>
> ECB 3110
>
> Madison, WI  53706
>
> E: kurt.kupcho at wisc.edu <mailto:kurt.kupcho at wisc.edu>
>
> T:  608-262-2982
>
>
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