[labnetwork] What is this??

[Martin, Michael]

I'd bet that is your window getting etched by the DRIE process.  Plasma reactor windows are a consumable.
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Emma Anquillare <eanquillare at gc.cuny.edu>
Sent: Wednesday, April 15, 2026 9:37 PM
To: Network Fab <labnetwork at mtl.mit.edu>
Subject: [labnetwork] What is this??


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Dear LabNetwork,

I humbly call upon your mighty wisdom! A few weeks ago I noticed what (I thought) was some kind of polymer gunk or residue on the interior of our ICP-F porthole window. (See images attached). We have been running a DRIE/Bosch process every few months, so despite manual cleans before and after each session it didn't seem too remote that polymer residue could build up on the porthole, which is usually not scrubbed.

However, when I went to get rid of it during my monthly manual clean of the tool, it wouldn't go away. I tried rubbing it with IPA on a lab wipe, as well as scratching at it more forcefully with IPA-soaked swabs, and even scratching with the rear plastic part of the swab. It appeared to go away at first when wet, but once the IPA evaporated, I could see I hadn't actually removed anything. My manual scrubs are also followed by a lengthy hour-and-a-half dry clean (O2-50, SF6- 10, 10mT, 20 C, RF- 100W, ICP- 2500 W) that users also use for a shorter period after each session. I've been managing this tool for about two years now and never seen anything like this.

Does anyone know what it is, if it's a concern, and if/how I should remove it?

Thanks!
Emma
_____________________________________________
Emma Anquillare, PhD
Research Scientist
ASRC Nanofabrication Facility
City University of New York

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