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<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'>Hi <o:p></o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'><o:p> </o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'>We are having trouble with our Denton Sputter System. In
the past, we were able to use it to sputter metals, Silicon, SiO2, Cu, Nickel
and Chromium. Currently, we are unable to sputter anything using our DC power
supply. The voltage sits around 500V, but no current, and it does not create a
plasma, using an Aluminum target. In addition, we have melted the insulator
rings, had them rebuilt and then melted them a second time once they were
returned. We are beating our heads against the wall with this problem. Since
the guns have been rebuilt, we have noticed a higher reflected power for RF
(~10-12% for copper targets) and the deposition rate for Silicon has gone way
down. <o:p></o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'><o:p> </o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'>Any advice would be most appreciated.<o:p></o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'><o:p> </o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'>Thanks<o:p></o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'>Neil<o:p></o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'><o:p> </o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'><o:p> </o:p></span></font></p>
<p class=MsoNormal><font size=2 face=Arial><span style='font-size:10.0pt;
font-family:Arial'><o:p> </o:p></span></font></p>
<p class=MsoNormal><font size=2 face="Times New Roman"><span style='font-size:
10.0pt'>Neil Peters<br>
Process Lab Engineer<br>
Department of Chemical and Materials Engineering<br>
<a href="http://www.engr.sjsu.edu/cme" target="_blank"
title="blocked::http://www.engr.sjsu.edu/cme">http://www.engr.sjsu.edu/cme</a><br>
<st1:place w:st="on"><st1:PlaceName w:st="on">San Jose</st1:PlaceName> <st1:PlaceType
w:st="on">State</st1:PlaceType> <st1:PlaceType w:st="on">University</st1:PlaceType></st1:place>
voice: (408) 924-3967<br>
<st1:Street w:st="on"><st1:address w:st="on">One Washington Square</st1:address></st1:Street>
fax: (408) 924-4057<br>
<st1:place w:st="on"><st1:City w:st="on">San Jose</st1:City>, <st1:State w:st="on">CA</st1:State>
<st1:PostalCode w:st="on">95192-0082</st1:PostalCode></st1:place><br>
E-mail: npeters@email.sjsu.edu</span></font><o:p></o:p></p>
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12.0pt'><o:p> </o:p></span></font></p>
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