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<P DIR=LTR><SPAN LANG="en-us"><FONT FACE="Calibri">Hello Mark,</FONT></SPAN></P>
<P DIR=LTR><SPAN LANG="en-us"> <FONT FACE="Calibri">My name is Jeff Grau and I am the equipment owner here at Purdue University. I am responding to your email regarding our equipment.</FONT></SPAN><SPAN LANG="en-us"></SPAN></P>
<P DIR=LTR><SPAN LANG="en-us"><FONT FACE="Calibri"></FONT></SPAN><SPAN LANG="en-us"> <FONT FACE="Calibri">1)</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri"></FONT></SPAN><SPAN LANG="en-us"> <FONT FACE="Calibri">We</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri"> presently have two Electromask CC-251 Criss Cross</FONT></SPAN><SPAN LANG="en-us"> <FONT FACE="Calibri">machines. One machine is set up for pattern generation and image repeating</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri"> with a 10x lens. The other Electromask is set up for pattern generation and image repeating with a 5x lens.</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri"> The 5x lens enables us to image a chip size of 2 centimeters</FONT></SPAN><SPAN LANG="en-us"> <FONT FACE="Calibri">by 2 centimeters</FONT></SPAN><SPAN LANG="en-us"> <FONT FACE="Calibri">which is very beneficial in the Mem</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri">s application.</FONT></SPAN><SPAN LANG="en-us"></SPAN></P>
<P DIR=LTR><SPAN LANG="en-us"><FONT FACE="Calibri">2)</FONT></SPAN><SPAN LANG="en-us"> <FONT FACE="Calibri">It would be nice to have a Micronic MP-80 system sometime in the future.</FONT></SPAN></P>
<P DIR=LTR><SPAN LANG="en-us"><FONT FACE="Calibri">3) I operated</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri">, trained new employees,</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri"> and maintained a</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri"> Micronic MP-80 and a Micronic LRS-600 laser writer system</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri">.</FONT></SPAN></P>
<P DIR=LTR><SPAN LANG="en-us"><FONT FACE="Calibri">4)Both Electomask systems provide sufficient results for</FONT></SPAN><SPAN LANG="en-us"> <FONT FACE="Calibri">most students at Purdue University. If sub-micron features are required, the VB-6 E-Beam or the Raith system will then generate the mask for the st</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri">udents Both Electromask systems are capable of generating features as small as 1.25 microns.</FONT></SPAN></P>
<P DIR=LTR><SPAN LANG="en-us"><FONT FACE="Calibri">5</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri">) Both Electromasks are currently handling all of the mask submissions. The typical lead time is less than 2 days from the time the data is approved</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri"> from the student. Throughput is based on the size of the flash count. A typical day for generating masks is</FONT></SPAN><SPAN LANG="en-us"> <FONT FACE="Calibri">8</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri"> masks per d</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri">ay.</FONT></SPAN></P>
<P DIR=LTR><SPAN LANG="en-us"><FONT FACE="Calibri">6)We develop all our masks using an APT automatic mask processor.</FONT></SPAN></P>
<P DIR=LTR><SPAN LANG="en-us"><FONT FACE="Calibri">7)</FONT></SPAN><SPAN LANG="en-us"> <FONT FACE="Calibri">We etch our masks using the APT processor. When etching Iron Oxide masks we use a Pyrex dish.</FONT></SPAN></P>
<P DIR=LTR><SPAN LANG="en-us"><FONT FACE="Calibri">8)</FONT></SPAN><SPAN LANG="en-us"><FONT FACE="Calibri">Our facility is an academic environment</FONT></SPAN><SPAN LANG="en-us"></SPAN></P>
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