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</o:shapelayout></xml><![endif]--></head><body bgcolor=white lang=EN-US link=blue vlink=purple><div class=WordSection1><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'>Well that is great info,<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'><o:p> </o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'>Here are my results so far, thanks to all whom have wrote replies:<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'><o:p> </o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'>Removed the Teflon ring and the F peak on the plasma scope reduced by about 30%, the ring shows heavy etch damage, according to STS it is needed in the system to help confine the plasma<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'>We found out that the “o”-ring that seals the chamber cover is greased with fomblin grease, changing that out today, data to come.<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'>We will swap out the dry pump for a new one to see if we have an oil back-stream issue due to a bad seal. One stage on the dry pump uses Fomblin oil.<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'>All of you have suggested very long O2 cleans so we are going to try that after the grease and pump change. We are also going to increase the O2 flow to 125sccm from 50sccm, increase the pressure to 250mT and increase the power.<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'><o:p> </o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'>Any more ideas out there?<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'><o:p> </o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'>Rick<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'><o:p> </o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D'><o:p> </o:p></span></p><div><div style='border:none;border-top:solid #B5C4DF 1.0pt;padding:3.0pt 0in 0in 0in'><p class=MsoNormal><b><span style='font-size:10.0pt;font-family:"Tahoma","sans-serif";color:windowtext'>From:</span></b><span style='font-size:10.0pt;font-family:"Tahoma","sans-serif";color:windowtext'> Mac Hathaway [mailto:Hathaway@cns.fas.harvard.edu] <br><b>Sent:</b> Friday, July 29, 2011 9:45 AM<br><b>To:</b> Mary Tang<br><b>Cc:</b> Morrison, Richard H., Jr.; labnetwork@mtl.mit.edu<br><b>Subject:</b> Re: [labnetwork] Need RIE help<o:p></o:p></span></p></div></div><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Hey all,<br><br>This is Mac, at Harvard CNS. Our STS has shown some symptoms of this due to polymer on the walls coming off in the O2 clean, introducing fluorine via that route.<br><br>When you wrote "the F peak is clipped of in height during the O2 plasma clean?" Did you mean it was still there, but shorter? This would clearly indicate the F is still there, and the only question is where it's coming from.<br><br>Perhaps a longer chamber clean, with a low-pressure step to spread out the cleaning plasma, before the stripping runs?...<br><br>Keep in mind that an O2 resist strip can gum up your chamber, and cause instability in your regular etch processes if you're not careful.<br><br><br>Mac<br><br>Mary Tang wrote: <o:p></o:p></p><p class=MsoNormal>Hi Richard --<br><br>A similar problem was observed and diagnosed on one of our O2 ashers by one of our industrial labmembers who was a plasma etch engineer at HP. The cause seems to have been trace amounts Fomblin pump fluid coming back into the chamber -- Fomblin is basically a polymerized freon, so there's your fluorine source.<br><br>Mary<br><br><br><br><o:p></o:p></p><pre>-- <o:p></o:p></pre><pre>Mary X. Tang, Ph.D.<o:p></o:p></pre><pre>Stanford Nanofabrication Facility<o:p></o:p></pre><pre>Paul G. Allen Room 136, Mail Code 4070<o:p></o:p></pre><pre>Stanford, CA 94305<o:p></o:p></pre><pre>(650)723-9980<o:p></o:p></pre><pre><a href="mailto:mtang@stanford.edu">mtang@stanford.edu</a><o:p></o:p></pre><pre><a href="http://snf.stanford.edu">http://snf.stanford.edu</a><o:p></o:p></pre><p class=MsoNormal><br><br>On 7/27/2011 4:58 AM, Morrison, Richard H., Jr. wrote: <o:p></o:p></p><div><p>Hi Everyone, <o:p></o:p></p><p> <o:p></o:p></p><p>Our facility uses an STS RIE tool (100mm wafers), to etch Nitrides/Oxides/Ti and resist cleans. I have a big problem when we use O2 to clean off resist from wafers. It seems that just running O2 plasma we etch 1000A/min of SiO2. It should be impossible to etch SiO2 with O2 plasma. <o:p></o:p></p><p> <o:p></o:p></p><p>In trouble shooting we have done the following, change the Teflon wafer holder, disconnected the SF6, CF4 and CHF3 tanks and capped the lines, then pumped the machine down and just ran O2 and we still etched the SiO2 at 1000A/min. We have a plasma scope and the F peak is clipped of in height during the O2 plasma clean? <o:p></o:p></p><p> <o:p></o:p></p><p>Does anybody have any ideas on what may be going on. <o:p></o:p></p><p> <o:p></o:p></p><p>Thanks in advance, <o:p></o:p></p><p>Rick <o:p></o:p></p><p> <o:p></o:p></p><p> <o:p></o:p></p><p> <o:p></o:p></p><p> <o:p></o:p></p><p>Rick Morrison <o:p></o:p></p><p>Senior Member Technical Staff <o:p></o:p></p><p>Acting Group Leader Mems Fabrication <o:p></o:p></p><p>Draper Laboratory <o:p></o:p></p><p>555 Technology Square <o:p></o:p></p><p>Cambridge, MA 02139 <o:p></o:p></p><p> <o:p></o:p></p><p>617-258-3420 <o:p></o:p></p><p> <o:p></o:p></p></div><pre><o:p> </o:p></pre><pre>_______________________________________________<o:p></o:p></pre><pre>labnetwork mailing list<o:p></o:p></pre><pre><a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><o:p></o:p></pre><pre><a href="https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork">https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork</a><o:p></o:p></pre><pre> <o:p></o:p></pre><p class=MsoNormal><o:p> </o:p></p></div></body></html>