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</o:shapelayout></xml><![endif]--></head><body bgcolor=white lang=EN-US link=blue vlink=purple><div class=WordSection1><p class=MsoNormal><span style='color:#1F497D'>By our data that is what is happening, I do not understand at this time if anything else plays a role. We also saw a reduction in N2 peaks (using a plasma scope to look at the plasma cloud) and some other things dropped. <o:p></o:p></span></p><p class=MsoNormal><span style='color:#1F497D'>Good point about the patent, need to research that.<o:p></o:p></span></p><p class=MsoNormal><span style='color:#1F497D'>This Teflon ring makes the plasma harder to understand, if I get anything I else I will share it with the group.<o:p></o:p></span></p><p class=MsoNormal><span style='color:#1F497D'><o:p> </o:p></span></p><p class=MsoNormal><span style='color:#1F497D'>Rick<o:p></o:p></span></p><p class=MsoNormal><span style='color:#1F497D'><o:p> </o:p></span></p><p class=MsoNormal><span style='color:#1F497D'><o:p> </o:p></span></p><div><div style='border:none;border-top:solid #B5C4DF 1.0pt;padding:3.0pt 0in 0in 0in'><p class=MsoNormal><b><span style='font-size:10.0pt;font-family:"Tahoma","sans-serif";color:windowtext'>From:</span></b><span style='font-size:10.0pt;font-family:"Tahoma","sans-serif";color:windowtext'> Bernard Alamariu [mailto:bernard@mtl.mit.edu] <br><b>Sent:</b> Thursday, August 11, 2011 2:04 PM<br><b>To:</b> Morrison, Richard H., Jr.<br><b>Cc:</b> labnetwork@mtl.mit.edu; Eric S. Lim; Bernard<br><b>Subject:</b> Re: [labnetwork] Results of the STS RIE oxide etch mystery<o:p></o:p></span></p></div></div><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Hi,<br><br>Great! <br><br>I understood that you can sustain a 1,000A/ min SiO2 etch with CFn+ ions from a Solid Teflon Source,<br>triggered by O2 plasma. Correct?<br><br>Very Interesting! Do you plan to make Patent application?<br><br>I think that would be a very good example of the just as they said: "Don't let a Crisis go to Waste!"<br><br>Thanks, Bernard<br><br><br>On 8/10/11 3:57 PM, Morrison, Richard H., Jr. wrote: <o:p></o:p></p><p class=MsoNormal>Hi Everyone,<o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal>I would like to thanks the many people that responded to my initial email about the STS RIE tool etching SiO2 during an O2 plasma.<o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal>To sum up:<o:p></o:p></p><p class=MsoNormal>We replaced the vacuum pump to ensure no oil back streaming (Ebara dry pump), no change in etch rate or in the plasma emission.<o:p></o:p></p><p class=MsoNormal>We replaced the cover o-ring (old one had Fomblin grease), no change in etch rate or in the plasma emission.<o:p></o:p></p><p class=MsoNormal>Scrubbed the walls and ran long multi hour O2 clean, no change in etch rate or in the plasma emission.<o:p></o:p></p><p class=MsoNormal>Removed the Teflon Shield Ring (installed around the chuck), etch rate went to zero and F was gone from the plasma emissions.<o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal>So it appears that the O2 plasma is liberating F from the Teflon ring which in turns etches the SiO2. We are consulting STS to see if there is a fix. If there is I will let you all know.<o:p></o:p></p><p class=MsoNormal><br>Thanks<o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal>Rick<o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal>Rick Morrison<o:p></o:p></p><p class=MsoNormal>Senior Member Technical Staff <o:p></o:p></p><p class=MsoNormal>Acting Group Leader Mems Fabrication<o:p></o:p></p><p class=MsoNormal>Draper Laboratory<o:p></o:p></p><p class=MsoNormal>555 Technology Square<o:p></o:p></p><p class=MsoNormal>Cambridge, MA 02139<o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal>617-258-3420<o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal><span style='font-size:12.0pt;font-family:"Times New Roman","serif"'><br><br><br><o:p></o:p></span></p><pre>_______________________________________________<o:p></o:p></pre><pre>labnetwork mailing list<o:p></o:p></pre><pre><a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><o:p></o:p></pre><pre><a href="https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork">https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork</a><o:p></o:p></pre><p class=MsoNormal><span style='font-size:12.0pt;font-family:"Times New Roman","serif"'><o:p> </o:p></span></p></div></body></html>