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<font size="-1">Hello;<br>
<br>
At the University of Minnesota we use a10 % mixture on an
atmospheric system with <br>
the normal alloy temperature being 425C also have a 450C alloy
process, time of 30 min. <br>
Besides the normal safety items like over temperature limits, we
have limited the <br>
time the door can be open during loading of the wafers. If this
time is exceeded <br>
the recipe goes to an abort step. This is done to reduce the
amount of firing on the <br>
end zone if the tube was allowed to stay open too long. <br>
<br>
Regards, Tony Whipple<br>
<br>
<br>
</font><br>
On 11/13/2012 2:11 PM, Aebersold,Julia W. wrote:
<blockquote
cite="mid:D84411B2FA8CBA42BC4868D5382CA1BB57CE692B@EXMBX09.ad.louisville.edu"
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<p class="MsoNormal">I wanted to gather some information of
aluminum anneal on a silicon wafer performed by other
cleanrooms. We are using 5% forming gas with an anneal temp
of 400C for ½ hour with a 20C/min ramp up and ramp down
However, I have also seen higher temps up to 475C, but was
concerned about the flammability of 100% hydrogen per its
MSDS.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Cheers!<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Julia Aebersold, Ph.D. <o:p></o:p></p>
<p class="MsoNormal">MNTC Cleanroom Manager<o:p></o:p></p>
<p class="MsoNormal">Shumaker Research Building, Room 233<o:p></o:p></p>
<p class="MsoNormal">2210 South Brook Street<o:p></o:p></p>
<p class="MsoNormal">University of Louisville<o:p></o:p></p>
<p class="MsoNormal">Louisville, KY 40292<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">502-852-1572<o:p></o:p></p>
<p class="MsoNormal"><a class="moz-txt-link-freetext" href="http://louisville.edu/micronano/">http://louisville.edu/micronano/</a><o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
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