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<span style="font-size: 13.5pt; ">Lab Network members,</span><o:p></o:p></div>
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<div style="margin: 0in 0in 0.0001pt; "><font face="Times New Roman, serif"><span style="font-size: 16px;">The Birck Nanotechnology Center at Purdue is accepting offers on an </span></font><span style="font-family: 'Times New Roman', serif; font-size: 16px; background-color: white; ">Electromask/TRE
mask making system, model CC251-5X. </span><font face="Times New Roman, serif"><span style="font-size: 16px;">The system is fully operational and currently installed in our cleanroom. It is capable of writing patterns down to 1.5 microns with a die size
less than 2x2cm and 3 microns for die above 2x2cm. It can produce photomasks ranging in size from 3x3 inch to 8x8 inch. The image repeater camera is a 5x reduction lens. </span></font><span style="font-family: 'Times New Roman', serif; font-size: 16px; background-color: white; ">Full
system specifications can be sent upon request. Please contact me with any questions.</span><font face="Times New Roman, serif"><span style="font-size: 16px;"><o:p></o:p></span></font></div>
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<div style="margin: 0in 0in 0.0001pt; font-family: 'Times New Roman', serif; "><font size="4">Best Regards,<o:p></o:p></font></div>
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<div style="margin: 0in 0in 0.0001pt; font-family: 'Times New Roman', serif; "><font size="4">John</font></div>
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<div style="color: rgb(0, 0, 0); font-family: Helvetica; font-size: medium; font-style: normal; font-variant: normal; font-weight: normal; letter-spacing: normal; line-height: normal; orphans: 2; text-align: -webkit-auto; text-indent: 0px; text-transform: none; white-space: normal; widows: 2; word-spacing: 0px; -webkit-text-size-adjust: auto; -webkit-text-stroke-width: 0px; word-wrap: break-word; -webkit-nbsp-mode: space; -webkit-line-break: after-white-space; ">
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<div>John Coy</div>
<div>Microfab Research Engineer</div>
<div>Birck Nanotechnology Center</div>
<div>Purdue University</div>
<div><a href="mailto:jcoy@purdue.edu">jcoy@purdue.edu</a></div>
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