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<div><span class="Apple-style-span" style="font-family: Tahoma; font-size: 13px; ">Dear Colleagues,<br>
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We are planning to purchase a sputter coating machine (new or refurbished) that may be placed in our class 1000 cleanroom at the Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already got in touch with one vendor in California (ANATECH USA) and
received a quote from him but I would like to contact more manufacturers who would offer best suitable equipment that would fit well with our research needs with better price. Any advice about the manufacturers/vendors of such a machine would be much appreciated.<br>
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Here is a list of specific requirements from our users:<br>
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<span style="font-family: Consolas; ">1.In need of a more advanced sputter setup for</span></p>
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<span style="font-family: Consolas; ">niobium and niobium nitride deposition. DC/RF magnetron sputtering system. )</span></p>
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<span style="font-family: Consolas; ">Specific Reuirements:</span></p>
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<span><span>·<span style="font: normal normal normal 7pt/normal 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">sputtering machine that can sputter niobium or niobium nitride that becomes superconducting at cryogenic temperatures.</span></p>
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<span><span>·<span style="font: normal normal normal 7pt/normal 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-DC/RF magnetron sputtering system</span></p>
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<span><span>·<span style="font: normal normal normal 7pt/normal 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-This requires a cleaned argon discharge that has been passed through a liquid nitrogen trap, either outside
or inside the sputtering chamber.</span></p>
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<span><span>·<span style="font: normal normal normal 7pt/normal 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-The RF sputtering power level should be above 100 Watts.</span></p>
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<span><span>·<span style="font: normal normal normal 7pt/normal 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-There should be shutters inside the sputtering chamber that can be rotated into, or out of, the front of the
sample, at will.</span></p>
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<span><span>·<span style="font: normal normal normal 7pt/normal 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-There also should be a crystal oscillator thickness monitor so that we can measure the sputtered thickness
of the niobium or niobium nitride films.</span></p>
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<span><span>·<span style="font: normal normal normal 7pt/normal 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-Temperature ranges up to 700C</span></p>
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<span><span>·<span style="font: normal normal normal 7pt/normal 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-We shouldn't need more than 2 targets for our purpose, but it might be nice to support multiple targets in
a user facility</span></p>
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<span><span>·<span style="font: normal normal normal 7pt/normal 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-sample areas on the order of 10X10 cm</span></p>
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<span style="font-family: Consolas; "> </span></p>
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<span style="font-family: Consolas; ">2. In need for a high quality Nb deposition (superconductor). System requirements.</span></p>
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<span style="font-family: Consolas; ">3. Need magnetron sputter for high quality insulating film deposition.</span></p>
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<span style="font-family: Consolas; ">4. Potentially interested in sputtering metal and metal oxide (maybe reactive sputtering?).</span></p>
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<span style="font-family: Consolas; ">5. Indium Tin Oxide (transparent, conductive substrate) deposition needed. High vacuum required.</span></p>
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<span style="font-family: Consolas; ">6. </span><span style="font-size: 14pt; font-family: Calibri; ">dc/ac magnetron (deposition of both metal and ceramic possible)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- heating up to > 400C (preferably up to 600C)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 mTorr)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Power > 200 W (both dc and ac)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Chiller pump flow: > 5 lpm @20 psi</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Feeding oxidant possible (for example, 10% O2 / 90% N2)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; "> </span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">Optional</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- 4'' wafer size preferred, but smaller ones are still okay</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Substrate rotation control (for uniform deposition)</span></p>
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<br>
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<font class="Apple-style-span" face="Calibri" size="6"><span class="Apple-style-span" style="font-size: 19px;">Thanks,</span></font></p>
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<font class="Apple-style-span" face="Calibri" size="6"><span class="Apple-style-span" style="font-size: 19px;"><br>
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<div>Anand Gadre, Ph.D, MBA</div>
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<div>Director</div>
<div>Stem Cell Instrumentation Foundry (SCIF)</div>
<div>University of California, Merced</div>
<div>5200 N. Lake Road</div>
<div>Merced, CA 95343</div>
<div>Phone: (O): 209-228-2345</div>
<div>Phone (C): (209) 658-3879</div>
<div>Fax: (209) 228 4424</div>
<div>Email: agadre@ucmerced.edu</div>
<div>SCIF website: Scif.ucmerced.edu</div>
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