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<div style="direction: ltr;font-family: Tahoma;color: #000000;font-size: 10pt;">I would try Lesker they make excellent research tools.
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<div>Rick</div>
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<div id="divRpF368806" style="direction: ltr; "><font face="Tahoma" size="2" color="#000000"><b>From:</b> labnetwork-bounces@mtl.mit.edu [labnetwork-bounces@mtl.mit.edu] on behalf of Anand Gadre [agadre@ucmerced.edu]<br>
<b>Sent:</b> Friday, January 18, 2013 5:50 PM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] Sputter Coating Equipment<br>
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<div><span class="Apple-style-span" style="font-family:Tahoma; font-size:13px">Dear Colleagues,<br>
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We are planning to purchase a sputter coating machine (new or refurbished) that may be placed in our class 1000 cleanroom at the Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already got in touch with one vendor in California (ANATECH USA) and
received a quote from him but I would like to contact more manufacturers who would offer best suitable equipment that would fit well with our research needs with better price. Any advice about the manufacturers/vendors of such a machine would be much appreciated.<br>
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Here is a list of specific requirements from our users:<br>
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<span style="font-family:Consolas">1.In need of a more advanced sputter setup for</span></p>
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<span style="font-family:Consolas">niobium and niobium nitride deposition. DC/RF magnetron sputtering system. )</span></p>
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<span style="font-family:Consolas">Specific Reuirements:</span></p>
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<span><span>·<span style="font:normal normal normal 7pt/normal 'Times New Roman'"> </span></span></span><span style="font-family:Consolas">sputtering machine that can sputter niobium or niobium nitride that becomes superconducting at cryogenic temperatures.</span></p>
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<span><span>·<span style="font:normal normal normal 7pt/normal 'Times New Roman'"> </span></span></span><span style="font-family:Consolas">-DC/RF magnetron sputtering system</span></p>
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<span><span>·<span style="font:normal normal normal 7pt/normal 'Times New Roman'"> </span></span></span><span style="font-family:Consolas">-This requires a cleaned argon discharge that has been passed through a liquid nitrogen trap, either outside or inside
the sputtering chamber.</span></p>
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<span><span>·<span style="font:normal normal normal 7pt/normal 'Times New Roman'"> </span></span></span><span style="font-family:Consolas">-The RF sputtering power level should be above 100 Watts.</span></p>
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<span><span>·<span style="font:normal normal normal 7pt/normal 'Times New Roman'"> </span></span></span><span style="font-family:Consolas">-There should be shutters inside the sputtering chamber that can be rotated into, or out of, the front of the sample,
at will.</span></p>
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<span><span>·<span style="font:normal normal normal 7pt/normal 'Times New Roman'"> </span></span></span><span style="font-family:Consolas">-There also should be a crystal oscillator thickness monitor so that we can measure the sputtered thickness of the
niobium or niobium nitride films.</span></p>
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<span><span>·<span style="font:normal normal normal 7pt/normal 'Times New Roman'"> </span></span></span><span style="font-family:Consolas">-Temperature ranges up to 700C</span></p>
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<span><span>·<span style="font:normal normal normal 7pt/normal 'Times New Roman'"> </span></span></span><span style="font-family:Consolas">-We shouldn't need more than 2 targets for our purpose, but it might be nice to support multiple targets in a user
facility</span></p>
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<span><span>·<span style="font:normal normal normal 7pt/normal 'Times New Roman'"> </span></span></span><span style="font-family:Consolas">-sample areas on the order of 10X10 cm</span></p>
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<span style="font-family:Consolas"> </span></p>
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<span style="font-family:Consolas">2. In need for a high quality Nb deposition (superconductor). System requirements.</span></p>
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<span style="font-family:Consolas">3. Need magnetron sputter for high quality insulating film deposition.</span></p>
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<span style="font-family:Consolas">4. Potentially interested in sputtering metal and metal oxide (maybe reactive sputtering?).</span></p>
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<span style="font-family:Consolas">5. Indium Tin Oxide (transparent, conductive substrate) deposition needed. High vacuum required.</span></p>
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<span style="font-family:Consolas">6. </span><span style="font-size:14pt; font-family:Calibri">dc/ac magnetron (deposition of both metal and ceramic possible)</span></p>
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<span style="font-size:14pt; font-family:Calibri">- heating up to > 400C (preferably up to 600C)</span></p>
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<span style="font-size:14pt; font-family:Calibri">- Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 mTorr)</span></p>
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<span style="font-size:14pt; font-family:Calibri">- Power > 200 W (both dc and ac)</span></p>
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<span style="font-size:14pt; font-family:Calibri">- Chiller pump flow: > 5 lpm @20 psi</span></p>
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<span style="font-size:14pt; font-family:Calibri">- Feeding oxidant possible (for example, 10% O2 / 90% N2)</span></p>
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<span style="font-size:14pt; font-family:Calibri"> </span></p>
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<span style="font-size:14pt; font-family:Calibri">Optional</span></p>
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<span style="font-size:14pt; font-family:Calibri">- 4'' wafer size preferred, but smaller ones are still okay</span></p>
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<span style="font-size:14pt; font-family:Calibri">- Substrate rotation control (for uniform deposition)</span></p>
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<br>
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<font class="Apple-style-span" face="Calibri" size="6"><span class="Apple-style-span" style="font-size:19px">Thanks,</span></font></p>
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<font class="Apple-style-span" face="Calibri" size="6"><span class="Apple-style-span" style="font-size:19px"><br>
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<div>Anand Gadre, Ph.D, MBA</div>
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<div>Director</div>
<div>Stem Cell Instrumentation Foundry (SCIF)</div>
<div>University of California, Merced</div>
<div>5200 N. Lake Road</div>
<div>Merced, CA 95343</div>
<div>Phone: (O): 209-228-2345</div>
<div>Phone (C): (209) 658-3879</div>
<div>Fax: (209) 228 4424</div>
<div>Email: agadre@ucmerced.edu</div>
<div>SCIF website: Scif.ucmerced.edu</div>
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