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<div>Dear Anand,</div>
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<div>You may also want to consider Plassys:</div>
<div><a href="http://www.plassys.com/pageuk/renseignement/accueil/accueil.html">http://www.plassys.com/pageuk/renseignement/accueil/accueil.html</a></div>
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<div>We recently purchased a Plassys MP700S sputter system which is dedicated to the deposition of superconducting films of Niobium. The system is robust and well-built and we've obtained very encouraging results to date. Plassys was chosen as they were prepared
to guarantee certain minimum film characteristics which were of great interest to our researchers. If interested, additional system details can be found on our website:</div>
<div><a href="https://qncfab.uwaterloo.ca/equipment/all/plassys-mp700s-sputter-system/general-info">https://qncfab.uwaterloo.ca/equipment/all/plassys-mp700s-sputter-system/general-info</a></div>
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<div>Regards,</div>
<div>Vito </div>
<div>-- </div>
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<p class="MsoNormal" style="margin: 0cm 0cm 0.0001pt; font-size: 11pt; ">Vito Logiudice M.A.Sc., P.Eng.<o:p></o:p></p>
<p class="MsoNormal" style="margin: 0cm 0cm 0.0001pt; font-size: 11pt; ">Director of Operations, Quantum NanoFab<o:p></o:p></p>
<p class="MsoNormal" style="margin: 0cm 0cm 0.0001pt; font-size: 11pt; ">University of Waterloo<o:p></o:p></p>
<p class="MsoNormal" style="margin: 0cm 0cm 0.0001pt; font-size: 11pt; ">200 University Avenue West<o:p></o:p></p>
<p class="MsoNormal" style="margin: 0cm 0cm 0.0001pt; font-size: 11pt; ">Waterloo, ON Canada N2L 3G1<o:p></o:p></p>
<p class="MsoNormal" style="margin: 0cm 0cm 0.0001pt; font-size: 11pt; ">Tel: 1-519-888-4567 ext. 38703<o:p></o:p></p>
<p class="MsoNormal" style="margin: 0cm 0cm 0.0001pt; font-size: 11pt; ">Email: <a href="mailto:vlogiudi@uwaterloo.ca" style="color: blue; ">vlogiudi@uwaterloo.ca</a></p>
<p class="MsoNormal" style="margin: 0cm 0cm 0.0001pt; font-size: 11pt; ">Website:
<a href="https://qncfab.uwaterloo.ca">https://qncfab.uwaterloo.ca</a>/</p>
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<span style="font-weight:bold">From: </span>Anand Gadre <<a href="mailto:agadre@ucmerced.edu">agadre@ucmerced.edu</a>><br>
<span style="font-weight:bold">Date: </span>Friday, 18 January, 2013 5:50 PM<br>
<span style="font-weight:bold">To: </span>"<a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a>" <<a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a>><br>
<span style="font-weight:bold">Subject: </span>[labnetwork] Sputter Coating Equipment<br>
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<div><span class="Apple-style-span" style="font-family: Tahoma; font-size: 13px; ">Dear Colleagues,<br>
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We are planning to purchase a sputter coating machine (new or refurbished) that may be placed in our class 1000 cleanroom at the Stem Cell INstrumentation Foundry (SCIF) at UC Merced. I have already got in touch with one vendor in California (ANATECH USA) and
received a quote from him but I would like to contact more manufacturers who would offer best suitable equipment that would fit well with our research needs with better price. Any advice about the manufacturers/vendors of such a machine would be much appreciated.<br>
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Here is a list of specific requirements from our users:<br>
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<span style="font-family: Consolas; ">1.In need of a more advanced sputter setup for</span></p>
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<span style="font-family: Consolas; ">niobium and niobium nitride deposition. DC/RF magnetron sputtering system. )</span></p>
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<span style="font-family: Consolas; ">Specific Reuirements:</span></p>
<p class="MsoListParagraphCxSpFirst" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0.5in; font-size: 12pt; font-family: Cambria; text-indent: -0.25in; ">
<span><span>·<span style="font-style: normal; font-variant: normal; font-weight: normal; font-size: 7pt; line-height: normal; font-family: 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">sputtering machine that can sputter
niobium or niobium nitride that becomes superconducting at cryogenic temperatures.</span></p>
<p class="MsoListParagraphCxSpMiddle" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0.5in; font-size: 12pt; font-family: Cambria; text-indent: -0.25in; ">
<span><span>·<span style="font-style: normal; font-variant: normal; font-weight: normal; font-size: 7pt; line-height: normal; font-family: 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-DC/RF magnetron sputtering system</span></p>
<p class="MsoListParagraphCxSpMiddle" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0.5in; font-size: 12pt; font-family: Cambria; text-indent: -0.25in; ">
<span><span>·<span style="font-style: normal; font-variant: normal; font-weight: normal; font-size: 7pt; line-height: normal; font-family: 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-This requires a cleaned argon discharge
that has been passed through a liquid nitrogen trap, either outside or inside the sputtering chamber.</span></p>
<p class="MsoListParagraphCxSpMiddle" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0.5in; font-size: 12pt; font-family: Cambria; text-indent: -0.25in; ">
<span><span>·<span style="font-style: normal; font-variant: normal; font-weight: normal; font-size: 7pt; line-height: normal; font-family: 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-The RF sputtering power level should
be above 100 Watts.</span></p>
<p class="MsoListParagraphCxSpMiddle" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0.5in; font-size: 12pt; font-family: Cambria; text-indent: -0.25in; ">
<span><span>·<span style="font-style: normal; font-variant: normal; font-weight: normal; font-size: 7pt; line-height: normal; font-family: 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-There should be shutters inside
the sputtering chamber that can be rotated into, or out of, the front of the sample, at will.</span></p>
<p class="MsoListParagraphCxSpMiddle" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0.5in; font-size: 12pt; font-family: Cambria; text-indent: -0.25in; ">
<span><span>·<span style="font-style: normal; font-variant: normal; font-weight: normal; font-size: 7pt; line-height: normal; font-family: 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-There also should be a crystal
oscillator thickness monitor so that we can measure the sputtered thickness of the niobium or niobium nitride films.</span></p>
<p class="MsoListParagraphCxSpMiddle" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0.5in; font-size: 12pt; font-family: Cambria; text-indent: -0.25in; ">
<span><span>·<span style="font-style: normal; font-variant: normal; font-weight: normal; font-size: 7pt; line-height: normal; font-family: 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-Temperature ranges up to 700C</span></p>
<p class="MsoListParagraphCxSpMiddle" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0.5in; font-size: 12pt; font-family: Cambria; text-indent: -0.25in; ">
<span><span>·<span style="font-style: normal; font-variant: normal; font-weight: normal; font-size: 7pt; line-height: normal; font-family: 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-We shouldn't need more than 2 targets
for our purpose, but it might be nice to support multiple targets in a user facility</span></p>
<p class="MsoListParagraphCxSpLast" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0.5in; font-size: 12pt; font-family: Cambria; text-indent: -0.25in; ">
<span><span>·<span style="font-style: normal; font-variant: normal; font-weight: normal; font-size: 7pt; line-height: normal; font-family: 'Times New Roman'; "> </span></span></span><span style="font-family: Consolas; ">-sample areas on the order of 10X10
cm</span></p>
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<span style="font-family: Consolas; "> </span></p>
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<span style="font-family: Consolas; ">2. In need for a high quality Nb deposition (superconductor). System requirements.</span></p>
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<span style="font-family: Consolas; ">3. Need magnetron sputter for high quality insulating film deposition.</span></p>
<p class="MsoNormal" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0in; font-size: 12pt; font-family: Cambria; ">
<span style="font-family: Consolas; ">4. Potentially interested in sputtering metal and metal oxide (maybe reactive sputtering?).</span></p>
<p class="MsoNormal" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0in; font-size: 12pt; font-family: Cambria; ">
<span style="font-family: Consolas; ">5. Indium Tin Oxide (transparent, conductive substrate) deposition needed. High vacuum required.</span></p>
<p class="MsoNormal" style="margin-top: 0in; margin-bottom: 0.0001pt; margin-right: 0in; margin-left: 0in; font-size: 12pt; font-family: Cambria; ">
<span style="font-family: Consolas; ">6. </span><span style="font-size: 14pt; font-family: Calibri; ">dc/ac magnetron (deposition of both metal and ceramic possible)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- heating up to > 400C (preferably up to 600C)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Ar pressure range covers 5 mTorr - 50 mTorr (base pressure < 1 mTorr)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Power > 200 W (both dc and ac)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Chiller pump flow: > 5 lpm @20 psi</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Feeding oxidant possible (for example, 10% O2 / 90% N2)</span></p>
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<span style="font-size: 14pt; font-family: Calibri; "> </span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">Optional</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- 4'' wafer size preferred, but smaller ones are still okay</span></p>
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<span style="font-size: 14pt; font-family: Calibri; ">- Substrate rotation control (for uniform deposition)</span></p>
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<br>
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<font class="Apple-style-span" face="Calibri" size="6"><span class="Apple-style-span" style="font-size: 19px;">Thanks,</span></font></p>
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<font class="Apple-style-span" face="Calibri" size="6"><span class="Apple-style-span" style="font-size: 19px;"><br>
</span></font></p>
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<div>Anand Gadre, Ph.D, MBA</div>
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<div>Director</div>
<div>Stem Cell Instrumentation Foundry (SCIF)</div>
<div>University of California, Merced</div>
<div>5200 N. Lake Road</div>
<div>Merced, CA 95343</div>
<div>Phone: (O): 209-228-2345</div>
<div>Phone (C): (209) 658-3879</div>
<div>Fax: (209) 228 4424</div>
<div>Email: <a href="mailto:agadre@ucmerced.edu">agadre@ucmerced.edu</a></div>
<div>SCIF website: Scif.ucmerced.edu</div>
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