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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D">Hi Vamsi,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D">We had a similar problem with a very different plasma tool, a Tepla M4L. We used a CF4 plasma that created a deposit throughout the chamber. We were unable
to get the reflected power back to zero until we used scotchbrite to clean all of the aluminum surfaces (including the banana jack tray connections) and then ran a long O2 plasma clean.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D">Pat<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial","sans-serif";color:#1F497D">George Patrick Watson (Pat), Ph.D.</span><span style="color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial","sans-serif";color:#1F497D">Director of Operations</span><span style="color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial","sans-serif";color:#1F497D">PRISM Micro/Nano Fabrication Laboratory</span><span style="color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial","sans-serif";color:#1F497D">E-Quad J301A</span><span style="color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial","sans-serif";color:#1F497D">Princeton University</span><span style="color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial","sans-serif";color:#1F497D">Princeton, NJ 08544</span><span style="color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial","sans-serif";color:#1F497D"><a href="mailto:gwatson@princeton.edu"><span style="color:blue">gwatson@princeton.edu</span></a></span><span style="color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial","sans-serif";color:#1F497D">(609) 258 4626</span><span style="font-size:11.0pt;font-family:"Calibri","sans-serif";color:#1F497D"><o:p></o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:10.0pt;font-family:"Tahoma","sans-serif"">From:</span></b><span style="font-size:10.0pt;font-family:"Tahoma","sans-serif""> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu]
<b>On Behalf Of </b>N P VAMSI KRISHNA<br>
<b>Sent:</b> Monday, May 20, 2013 9:09 AM<br>
<b>To:</b> Labnetwork<br>
<b>Subject:</b> [labnetwork] C4F8 polymer deposition in RIE - issues related to that<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="font-family:"Verdana","sans-serif";color:#000066">Dear Colleagues,<o:p></o:p></span></p>
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<p class="MsoNormal" style="margin-bottom:12.0pt"><span style="font-family:"Verdana","sans-serif";color:#000066">Recently we had a problem in our RIE (Oxford Plasma lab system 100) tool. The RF Lower electrode was giving very high reflected powers for some
recipes and DC bias close to 0V and we realized the auto match capacitors are misaligned. After a long effort we could got that back to almost normal, by manually tuning the RF auto match and doing error corrections.
<br>
The last recipe which ran on the tool was depositing C4F8 for 10 min. Before this run chamber was clean. (We normally don't encourage polymer deposition in our RIE tool for longer durations)
<o:p></o:p></span></p>
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<p class="MsoNormal" style="margin-bottom:12.0pt"><span style="font-family:"Verdana","sans-serif";color:#000066">Does any one face similar problem or any idea if C4F8 polymer deposition could do this and why?
<o:p></o:p></span></p>
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-- <br>
<span style="font-family:"Verdana","sans-serif";color:#000066">Thanks & Regards,<br>
<br>
<b><i>Vamsi Krishna</i></b><br>
Sr.Facility Technologist - Process Integration<br>
National Nano Fabrication Center<br>
Center for Nano Science and Engineering (CeNSE)<br>
Indian Institute of Science(IISc)<br>
Bangalore 560012, INDIA<br>
Mobile: +91 9880988239</span><br>
<span style="font-family:"Verdana","sans-serif""><br>
</span><i><span style="font-size:7.5pt;font-family:"Verdana","sans-serif";color:#000066">A bird sitting on the branch of a tree is not afraid of the branch shaking or breaking, because it trusts not the branches but its OWN WINGS.
</span></i><o:p></o:p></p>
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