<html><head><meta http-equiv="content-type" content="text/html; charset=utf-8"></head><body dir="auto"><div><span></span></div><div><meta http-equiv="content-type" content="text/html; charset=utf-8"><div>In a hurry, I just realized I miss spelled the name of the H2 generator, it's Hogen and is made by <br><a href="http://www.protononsite.com/">http://www.protononsite.com/</a>.</div><div><br></div><div>Thanks</div><div><br></div><div>Craig<br>Sent from my iPad</div><div><br>On Sep 11, 2013, at 9:37 AM, Craig Cheney <<a href="mailto:ccheney@infinityhps.com">ccheney@infinityhps.com</a>> wrote:<br><br></div><blockquote type="cite"><div><meta http-equiv="content-type" content="text/html; charset=utf-8"><div>Julia,</div><div><br></div><div>Another option that I neglected to mention for your H2 source is an H2 generator. Hogan has different models that would work great for you. You would need a reliable DI water source for this, but there are many advantages with a system like this. Let me know if you have any other questions.</div><div><br></div><div>Craig<br><br>Sent from my iPad</div><div><br>On Sep 11, 2013, at 9:26 AM, "Aebersold,Julia W." <<a href="mailto:julia.aebersold@louisville.edu">julia.aebersold@louisville.edu</a>> wrote:<br><br></div><blockquote type="cite"><div>
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<div style="direction: ltr;font-family: Tahoma;color: #000000;font-size: 10pt;">Mnay thanx Craig for the in depth information and will add this to our considerations. The intent of this tool is for GaN growth.
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<div>Cheers!<br>
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<p>Julia Aebersold, Ph.D.</p>
<p>MNTC Cleanroom Manager</p>
<p>University of Louisville</p>
<p>2210 South Brook Street</p>
<p>Shumaker Research Building, Room 233</p>
<p>Louisville, KY 40292</p>
<p> </p>
<p>(502) 852-1572</p>
<p><a href="http://louisville.edu/micronano/">http://louisville.edu/micronano/</a><br>
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<div id="divRpF822798" style="direction: ltr;"><font face="Tahoma" size="2" color="#000000"><b>From:</b> Craig Cheney [<a href="mailto:ccheney@infinityhps.com">ccheney@infinityhps.com</a>]<br>
<b>Sent:</b> Tuesday, September 10, 2013 5:03 PM<br>
<b>To:</b> Aebersold,Julia W.; <a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<b>Cc:</b> <a href="mailto:ccheney@infinityhps.com">ccheney@infinityhps.com</a>; <a href="mailto:bfisher@infinityhps.com">bfisher@infinityhps.com</a><br>
<b>Subject:</b> RE: [labnetwork] MOCVD systems<br>
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<p class="MsoNormal"><span style="color:#1F497D">Julia,</span></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span></p>
<p class="MsoNormal"><span style="color:#1F497D"> We have installed quite a few MOCVD reactors at different Universities and production facilities in different settings. There are many nuances to installing and operating a MOCVD reactor. With so many different
details to discuss I will list the major ones in order of importance. Without knowing what type of material you will be growing I will list the options that would apply to all and note possible options for you.</span></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span></p>
<p class="MsoNormal"><b><span style="color:#1F497D">Facilities:</span></b></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Location</span></u><span style="color:#1F497D">, we have installed MOCVD reactors in non-clean room areas where the reactors had a load lock. If the system you are looking at has a load lock you might want
to consider saving your expensive cleanroom square footage for a tool that requires it. One note here, most reactors that utilize a load lock (whether in a clean room or not) require 5% (H2) forming gas to condition the load lock. Another key consideration
is structure, these units take up a lot of floor space and are heavy, make sure your structure is rated to handle the weight, and plan ahead on how you are going to get it from your loading dock to its final destination.</span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Exhaust</span></u><span style="color:#1F497D">, the reactor will require some significant exhaust, make sure your clean room (or other if not in a cleanroom) make-up air handler is ready to make up the air
that will be exhausted. Another major concern for exhaust is, the type rating on the exhaust. Not knowing the requirements from your EH&S department, it would be a good idea to review with them the gases you will be using on the tool as well as well as the
contents of the process pump effluent, and whether or not you will be scrubbing your process exhaust.</span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">H2 Supply</span></u><span style="color:#1F497D">, you will need a large source of Hydrogen to operate this tool, and the higher the quality the better. If your campus has house Hydrogen or a bulk source for
it, your one step in the right direction. We had one customer (University) who tried running their reactor on a switch over panel with a four cylinder manifold on each side of the switch over, this type of setup caused them more problems and equipment repairs
than if they had just invested in a bulk source of Hydrogen. </span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Power</span></u><span style="color:#1F497D">, most reactors such as this will require quite a bit of power, typically 250 to 400 amps of 208V 3 phase power. One major consideration, if your reactor is purifying
the Hydrogen with an older style Palladium cell, you also might want to consider a UPS system for running the heaters for the Palladium cell, on the older style ones, if they cool off too fast they can crack the Palladium inside them and render them completely
useless (and they aren’t cheap to replace ~ 50k). The newer Palladium cells are a little more robust and can withstand more abuse. One other note, typically the process pumps on these type of reactors run 24X7 due to the fact that they quickly seize up when
shut down and allowed to cool, so be prepared for that also (process pumps for reactors are not cheap either).</span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Process Cooling water</span></u><span style="color:#1F497D">, MOCVD reactors require quite a bit of process cooling water, if your facility has a good house PCW system then you are probably ok, typical flow-rates
are around 60 to 100 LPM at 17-25 degrees C depending on manufacturer and reactor size.</span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Process Gas Delivery</span></u><span style="color:#1F497D">, without knowing what type of material you will be growing (III-V, II-VI, IV, IV-V-VI, semiconductors) I can’t say what type of gas you will be using,
but regardless of the type of semiconductor, you will be installing some toxic gas systems to support them. These gases will be required to be in gas cabinets with high quality purge panels, the gas cabinets will require building exhaust also, the gas delivery
lines will have to be high quality electro-polished stainless steel, some gas types will also be required to be coaxial style gas lines, the assembly method for gas lines are required to be welded throughout. Again, I would review all required gases with
your EH&S department to ensure you have the proper equipment to support them.</span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Life Safety</span></u><span style="color:#1F497D">, you will be required to incorporate life safety systems to monitor all spaces (gas cabinets, reactor, and people space) for the presence of flammable gas,
toxic gas (dependent on material type) and Oxygen deficient atm. </span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Process Exhaust</span></u><span style="color:#1F497D">, if you are going to be using scrubbers (typically activated charcoal bed type), you will need a good maintenance program to stay on top of the scrubber
maintenance, these units require regeneration and periodic charcoal changes. If you will not be using process exhaust scrubbers, then you need to make sure your process exhaust effluent is compatible with the building exhaust system you will be connecting
it to. Also, depending the material type grown your process exhaust lines may be required to be heated to prevent buildup of process byproducts.</span></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span></p>
<p class="MsoNormal"><b><span style="color:#1F497D">Operation:</span></b></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Maintenance</span></u><span style="color:#1F497D">, as far as operation goes with these systems they do require periodic maintenance which correlates to run time as with most semiconductor processing equipment.
Without a good understanding of the material type you will be growing it would be futile to mention different maintenance routines and what is required. I will say this much, if the required maintenance is not performed when it is supposed to be done, it
can cause process deviations, equipment failures, and possible life safety issues. Some reactor processes require acid based cleaning of components on the reactor chamber, you may need a wet bench to support this or a bench available for cleaning.</span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Analytical tools</span></u><span style="color:#1F497D">, depending on the film type grown, you will need to the proper analytical tools to measure the specific characteristics of the film type that you are
quantifying. </span></p>
<p class="MsoNormal"><u><span style="color:#1F497D">Waste Stream</span></u><span style="color:#1F497D">, again, depending on the type of material grown you will develop a waste stream that will need to be managed.</span></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span></p>
<p class="MsoNormal"><span style="color:#1F497D">Those are the major thoughts when considering a MOCVD reactor, we have helped many different customers achieve a cost effective solution with regards to installation and startup of these systems, so don’t let
all the details scare you. We would be happy discuss any questions or concerns that you might have. Please feel free to contact us with any other questions or concerns.</span></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span></p>
<p class="MsoNormal"><span style="color:#1F497D">Thank you,</span></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span></p>
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<p class="MsoNormal"><b><span style="font-family:"Arial","sans-serif"; color:navy">Craig Cheney</span></b></p>
<p class="MsoNormal"><span style="color:navy"><image001.jpg></span><span style="font-size:12.0pt; font-family:"Times New Roman","serif"; color:navy"></span></p>
<p class="MsoNormal"><span style="color:navy"> </span></p>
<p class="MsoNormal"><span style="color:navy"> </span></p>
<p class="MsoNormal"><b><span style="font-family:"Arial","sans-serif"; color:navy">Desk: (608)834-4200</span></b></p>
<p class="MsoNormal"><b><span style="font-family:"Arial","sans-serif"; color:navy">Fax: (608)834-4299</span></b></p>
<p class="MsoNormal"><b><span style="font-family:"Arial","sans-serif"; color:navy">Cell: (608)438-8714</span></b></p>
<p class="MsoNormal"><b><span style="font-family:"Arial","sans-serif"; color:navy"> </span></b></p>
<p class="MsoNormal" style=""><b><span style="font-size:10.0pt; font-family:"Arial","sans-serif"; color:navy">This e-mail transmission and any attachments to it are intended solely for the use of the individual or entity to whom it is addressed and may contain
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the sender immediately by replying to this message and delete it from your computer.</span></b></p>
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<p class="MsoNormal"><b><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"">From:</span></b><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif""> <a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a> [<a href="mailto:labnetwork-bounces@mtl.mit.edu">mailto:labnetwork-bounces@mtl.mit.edu</a>]
<b>On Behalf Of </b>Aebersold,Julia W.<br>
<b>Sent:</b> Tuesday, September 10, 2013 9:45 AM<br>
<b>To:</b> <<a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a>><br>
<b>Subject:</b> [labnetwork] MOCVD systems</span></p>
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<p class="MsoNormal"><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">Hi there! We are considering the installation of a Veeco E300 MOCVD system into our cleanroom. We have not had experience with this type of tool and would
like to ask the community if they have a system of this type in their cleanroom or in another room due to its size. Also, if you have any other concerns about operations, nuances, difficulty of operation, maintenance headaches, etc. I would be greatly appreciative.
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<p class="MsoNormal"><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">See everyone at UGIM 2014!</span></p>
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<p class="MsoNormal"><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">Cheers!</span></p>
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<p class="MsoNormal"><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black"> </span></p>
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<p><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">Julia Aebersold, Ph.D.</span></p>
<p><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">MNTC Cleanroom Manager</span></p>
<p><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">University of Louisville</span></p>
<p><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">2210 South Brook Street</span></p>
<p><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">Shumaker Research Building, Room 233</span></p>
<p><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">Louisville, KY 40292</span></p>
<p><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black"> </span></p>
<p><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black">(502) 852-1572</span></p>
<p><span style="font-size:10.0pt; font-family:"Tahoma","sans-serif"; color:black"><a href="http://louisville.edu/micronano/" target="_blank">http://louisville.edu/micronano/</a></span></p>
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