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</o:shapelayout></xml><![endif]--></head><body lang=EN-US link=blue vlink=purple><div class=WordSection1><p class=MsoNormal>I imagine that like most of you, we offer some standard baseline cleanroom processes for our users to implement. For example, there is a standard positive resist process and negative resist process, standard RIE etch recipes, etc. We’ve done some characterization of these processes in the past, especially when they were first set up, but we now want to be more intentional on monitoring these processes over time to be able to notice trends or problems before they affect our users.<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>I was wondering if other university cleanrooms do periodic process monitoring, and if so, what types of processes and monitoring have you found to be most useful for you and your users. Do you look at single isolated processes (e.g., evaporation thickness uniformity) or build devices that test the integration of multiple processes (e.g., MOS devices or TLM resistance structures) or a combination of both?<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Thanks,<o:p></o:p></p><p class=MsoNormal>Mark D. Walters, Ph.D.<o:p></o:p></p><p class=MsoNormal>Director, Shared Materials Instrumentation Facility (SMIF)<o:p></o:p></p><p class=MsoNormal>Duke University<o:p></o:p></p><p class=MsoNormal>Box 90271<o:p></o:p></p><p class=MsoNormal>Durham, NC 27708-0271<o:p></o:p></p><p class=MsoNormal><a href="blocked::http://smif.lab.duke.edu/" title="blocked::http://smif.lab.duke.edu/"><span style='color:blue'>http://smif.lab.duke.edu</span></a><o:p></o:p></p><p class=MsoNormal>Phone: (919) 660-5486<o:p></o:p></p><p class=MsoNormal>Fax: (919) 660-5491<o:p></o:p></p><p class=MsoNormal> <o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p></div></body></html>