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<p class="MsoNormal"><span style="color:#1F497D">Hi Errol,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Personally I support a thorough rinse step after these etchants. Especially the HF one as if not rinsed properly you take HF fumes with the sample and that pose Safety issues. Moreover if you look at the sample
immediately after etching in a microscope there is a big chance of attacking the objective lens due to HF fumes.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Regards, Fouad<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:10.0pt;font-family:"Tahoma","sans-serif"">From:</span></b><span lang="EN-US" style="font-size:10.0pt;font-family:"Tahoma","sans-serif""> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu]
<b>On Behalf Of </b>Errol V. Porter<br>
<b>Sent:</b> Thursday, 27 February 2014 9:44 AM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] Piranha & HF no rinse protocols<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><span lang="EN-US">Greetings,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">I am trying to get a consensus and feedback from the group on a wet etch process using 1<sup>st</sup> H2SO4:H2O2 (1:1) and 2<sup>nd</sup> HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice
in some special circumstances, what safeguards to you put in place to protect the users.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Regards,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Errol Porter<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">University of Arkansas / HiDEC<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">700 W. Research Center Blvd<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Fayetteville, AR 72701<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Tel. (479) 575-2519<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Mobile: (479) 236-0693<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Fax (479) 575-2719<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">email:<span style="color:#1F497D"> <a href="mailto:evporte@uark.edu">
evporte@uark.edu</a><o:p></o:p></span></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D"><a href="http://www.hidec.uark.edu/">http://www.hidec.uark.edu</a><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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