<html xmlns:v="urn:schemas-microsoft-com:vml" xmlns:o="urn:schemas-microsoft-com:office:office" xmlns:w="urn:schemas-microsoft-com:office:word" xmlns:m="http://schemas.microsoft.com/office/2004/12/omml" xmlns="http://www.w3.org/TR/REC-html40">
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<meta http-equiv="Content-Type" content="text/html; charset=us-ascii">
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<style><!--
/* Font Definitions */
@font-face
{font-family:"Cambria Math";
panose-1:2 4 5 3 5 4 6 3 2 4;}
@font-face
{font-family:Calibri;
panose-1:2 15 5 2 2 2 4 3 2 4;}
@font-face
{font-family:Tahoma;
panose-1:2 11 6 4 3 5 4 4 2 4;}
/* Style Definitions */
p.MsoNormal, li.MsoNormal, div.MsoNormal
{margin:0in;
margin-bottom:.0001pt;
font-size:11.0pt;
font-family:"Calibri","sans-serif";}
a:link, span.MsoHyperlink
{mso-style-priority:99;
color:blue;
text-decoration:underline;}
a:visited, span.MsoHyperlinkFollowed
{mso-style-priority:99;
color:purple;
text-decoration:underline;}
span.EmailStyle17
{mso-style-type:personal;
font-family:"Calibri","sans-serif";
color:windowtext;}
span.EmailStyle18
{mso-style-type:personal-reply;
font-family:"Calibri","sans-serif";
color:#1F497D;}
.MsoChpDefault
{mso-style-type:export-only;
font-size:10.0pt;}
@page WordSection1
{size:8.5in 11.0in;
margin:1.0in 1.0in 1.0in 1.0in;}
div.WordSection1
{page:WordSection1;}
--></style><!--[if gte mso 9]><xml>
<o:shapedefaults v:ext="edit" spidmax="1026" />
</xml><![endif]--><!--[if gte mso 9]><xml>
<o:shapelayout v:ext="edit">
<o:idmap v:ext="edit" data="1" />
</o:shapelayout></xml><![endif]-->
</head>
<body lang="EN-US" link="blue" vlink="purple">
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<p class="MsoNormal"><span style="color:#1F497D">HI,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Here at Draper we regulate the use of 1:1 Sulfuric/H2O2 to one bench and only one bath at a time. The mixture reacts very violently and heats very quickly. In fact one time the mixture caused a small fire as
a quartz bath failed and melted down and fire retardant plastic was melted and almost ignited.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">After that step there is a rinse in DI followed by the HF. You cannot mix the 1:1 with the HF bath that would be a bad idea, so you need to rinse after that step. If it is a bare silicon wafer then the wafer
sheets off of the wafer but not the wafer cassette or wafer holder so a rinse is needed. I guess you could try to take out the wafer and dry it somehow but that is very risky. HF is very dangerous I do not recommend skipping the rinse step.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Rick<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Draper Laboratory<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Principle Member of the Technical Staff<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Group Leader Microfabrication Operations<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">555 Technology Square<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Cambridge Ma, 02139-3563<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">www.draper.com<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">rmorrison@draper.com<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">W 617-258-3420<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">C 508-930-3461<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:10.0pt;font-family:"Tahoma","sans-serif"">From:</span></b><span style="font-size:10.0pt;font-family:"Tahoma","sans-serif""> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu]
<b>On Behalf Of </b>Errol V. Porter<br>
<b>Sent:</b> Wednesday, February 26, 2014 5:44 PM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] Piranha & HF no rinse protocols<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Greetings,<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">I am trying to get a consensus and feedback from the group on a wet etch process using 1<sup>st</sup> H2SO4:H2O2 (1:1) and 2<sup>nd</sup> HF:H2O (10:1) where the water rinse is omitted. If this is an acceptable practice in some special
circumstances, what safeguards to you put in place to protect the users.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Regards,<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Errol Porter<o:p></o:p></p>
<p class="MsoNormal">University of Arkansas / HiDEC<o:p></o:p></p>
<p class="MsoNormal">700 W. Research Center Blvd<o:p></o:p></p>
<p class="MsoNormal">Fayetteville, AR 72701<o:p></o:p></p>
<p class="MsoNormal">Tel. (479) 575-2519<o:p></o:p></p>
<p class="MsoNormal">Mobile: (479) 236-0693<o:p></o:p></p>
<p class="MsoNormal">Fax (479) 575-2719<o:p></o:p></p>
<p class="MsoNormal">email:<span style="color:#1F497D"> <a href="mailto:evporte@uark.edu">
evporte@uark.edu</a><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><a href="http://www.hidec.uark.edu/">http://www.hidec.uark.edu</a><o:p></o:p></span></p>
<p class="MsoNormal"><o:p> </o:p></p>
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