<div dir="ltr"><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">Hi Rick,</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">The issue may have been developing over a period of time and it appeared during CHF3 plasma. </div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">>From our experience: </div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">1. Please chk if there were any long only polymer (C4F8) based plasma runs done with out proper chamber cleans in between. If so, you may not observe any abnormalities inside the chamber, in fact the chamber looks polished. (not the combination of SF6 and C4F8 - Si etch recipe)</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">2. Near the ICP/antenna Coil on the top of the tool there will be a shielding ring, check that once. If the tool is nearing the maintenance that could have damaged and shorted. Which results in arcing. </div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">3.Check the coolant that is going to the ICP/antenna, coolant should not have particles. If you see any clean the lines (with N2 blowing) and replace with fresh coolant. </div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">4. Unplug the RF connectors from the RF generator and the tool, check if there is any abnormal black color. </div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">Hope it helps. </div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">Thanks & best regards,</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">vamsi</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><br></div><div class="gmail_extra"><br><div class="gmail_quote">On Tue, Mar 24, 2015 at 9:29 PM, Morrison, Richard H., Jr. <span dir="ltr"><<a href="mailto:rmorrison@draper.com" target="_blank">rmorrison@draper.com</a>></span> wrote:<br><blockquote class="gmail_quote" style="margin:0 0 0 .8ex;border-left:1px #ccc solid;padding-left:1ex">
<div lang="EN-US" link="blue" vlink="purple">
<div>
<p class="MsoNormal">Hi everyone,<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Just wanted to update you on what we have found out about the damage to the Substrates from the RIE tool we have. Again the tool is an Ulvac NE-550 high density RIE tool.<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">First of all we confirmed that we do not have an electrostatic chuck, but it is ceramic chuck with helium backside cooling and stainless lift pins going through the chuck to lift the wafer.<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">We tried to run Argon plasma before lifting and it did not solve the issue. We have also tried a long wait 5 minutes before we de-chuck.<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">The arc damage is only seen after we run a SiO2 etch using CHF3/CF4 gas ratio 55sccm/6sccm operating pressure is 2.66Pa, antenna power 500watts, RF bias at 100w.<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">We ran other wafers using a poly etch recipe SF6/O2 10sccm/10sccm 5Pa pressure, antenna power 800w, RF Bias 50 watts<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">We are still working with the manufacturer to figure this out. Any more ideas?<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Rick<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Draper Laboratory<u></u><u></u></p>
<p class="MsoNormal">Principal Member of the Technical Staff<u></u><u></u></p>
<p class="MsoNormal">Group Leader Microfabrication Operations<u></u><u></u></p>
<p class="MsoNormal">555 Technology Square<u></u><u></u></p>
<p class="MsoNormal">Cambridge Ma, 02139-3563<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal"><a href="http://www.draper.com" target="_blank">www.draper.com</a><u></u><u></u></p>
<p class="MsoNormal"><a href="mailto:rmorrison@draper.com" target="_blank">rmorrison@draper.com</a><u></u><u></u></p>
<p class="MsoNormal">W <a href="tel:617-258-3420" value="+16172583420" target="_blank">617-258-3420</a><u></u><u></u></p>
<p class="MsoNormal">C <a href="tel:508-930-3461" value="+15089303461" target="_blank">508-930-3461</a><u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
</div>
<hr>
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper Laboratory. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email
and immediately destroy all copies of this email.
<hr>
</div>
<br>_______________________________________________<br>
labnetwork mailing list<br>
<a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<a href="https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork" target="_blank">https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork</a><br>
<br></blockquote></div><br><br clear="all"><div><br></div>-- <br><div class="gmail_signature"><div dir="ltr"><font style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><span style="color:rgb(102,102,102)">--<br>Thanks & Best Regards,<br>-----------------<br><b>N.P.Vamsi Krishna</b></span><br><span>Center for Nano Science and Engineering (CeNSE),<br>Indian Institute of Science(IISc), Banga<font>lore.</font><br><font>INDIA</font></span>-</font><font style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><span>560012</span></font><br><br style="font-family:verdana,sans-serif"><font style="font-family:verdana,sans-serif" size="1"><i><font style="font-family:verdana,sans-serif;color:rgb(0,0,102)">A bird sitting on the branch of a tree is not afraid of the branch shaking or breaking, because it trusts not the branches but its OWN WINGS.</font></i></font><br></div></div>
</div></div>