<html><head></head><body style="word-wrap: break-word; -webkit-nbsp-mode: space; -webkit-line-break: after-white-space; "><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">Hi,</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;"> We are interested in adding SiO2 and SiN deposition capabilities to at least one of our ALD systems (specifically the Oxford FlexAL).</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">The system has two sets of independent precursor manifolds. </span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">Currently, one manifold is completely filled up with TMA, the Hf source and the W source, while the second manifold only has TiCl4 for depositing TiN and TiO2. </span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">The problem is that the TiCl4 source (and other such metal halide sources) is not compatible with metal amide sources and thus we can't put any metal amide precursors on the two open slots on the second precursor manifold. </span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;"><br></span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">Our users are interested in depositing SiO2 and SiN by using metal amide precursors like 3DMAS and BTBAS but that requires that the TiCl4 source be replaced with a compatible Ti precursor, such as TDMAT to deposit TiN.</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">The precursors we are considering based on what people seem to be using at other universities and a quick literature search are:</span></font></div><div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;"><br><b>SiO2</b></span></font><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">3DMAS/TDMAS <br>BTBAS<br><br></span></font></div><div><b style="font-size: 12px;"><font class="Apple-style-span" face="Arial">SiN</font></b></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">3DMAS <br><br></span></font></div><div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">Does anyone have any experience w/them & with TDMAT?</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">Any recommendations or suggestions for precursors for SiO2 and SiN?</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;"><br></span></font></div></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">We'd like to assess all of these precursors and films with respect to:</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">1) Cost and availability of precursor</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">2) Robustness of precursor (A precursor that degrades rapidly over time wld not be preferred)</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">3) Quality of film: Electrical data would be nice but even indices of refraction would do</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">4) Any chemical compatibility issues.</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">5) Existence of recipes on the Oxford ALD tool at other places. This will reduce the amount of optimization that we will need to do.</span></font></div></div></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;"><br></span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">We really appreciate any comments you might have.</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;">Thx,</span></font></div><div><font class="Apple-style-span" face="Arial"><span class="Apple-style-span" style="font-size: 12px;"> Vicky</span></font></div><div><div><br></div></div></body></html>