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<p class="MsoNormal"><span style="color:#1F497D">Rick<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Just as an FYI – the two manufacturers you listed sell similar yet distinctly different tools. SPTS sells an Anhydrous HF etch tool that utilizes Anhydrous HF gas as the etchant source under vacuum. OAI sells
an HF acid vapor etcher that utilizes HF acid as the etchant source at atmosphere. The etch mechanism is similar (if not technically the same) but the anhydrous system presumably does allow for better control of moisture on the etch surface which enables
materials and process that are sensitive to HF acid but not sensitive to anhydrous HF (aluminum is a good example of a material that will be attacked by HF acid but not by anhydrous HF).
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">I know of two manufacturers of HF acid Vapor systems:<o:p></o:p></span></p>
<p class="MsoListParagraph" style="text-indent:-.25in;mso-list:l1 level1 lfo2"><![if !supportLists]><span lang="EN-CA" style="color:#1F497D"><span style="mso-list:Ignore">1.<span style="font:7.0pt "Times New Roman"">
</span></span></span><![endif]><span style="color:#1F497D">I am pretty sure OAI and
</span><span lang="EN-CA" style="color:#1F497D">Idonus are the same tool.<o:p></o:p></span></p>
<p class="MsoListParagraph" style="text-indent:-.25in;mso-list:l1 level1 lfo2"><![if !supportLists]><span style="color:#1F497D"><span style="mso-list:Ignore">2.<span style="font:7.0pt "Times New Roman"">
</span></span></span><![endif]><span lang="EN-CA" style="color:#1F497D">Advanced Micromachining Tools
<a href="http://www.ammt.com/products/hydrofluoric-acid-vapor-etcher/">http://www.ammt.com/products/hydrofluoric-acid-vapor-etcher/</a></span><span style="color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">I also know of two manufacturers of Vacuum Anhydrous HF etch systems:<o:p></o:p></span></p>
<p class="MsoListParagraph" style="text-indent:-.25in;mso-list:l0 level1 lfo4"><![if !supportLists]><span style="color:#1F497D"><span style="mso-list:Ignore">1.<span style="font:7.0pt "Times New Roman"">
</span></span></span><![endif]><span style="color:#1F497D">SPTS<o:p></o:p></span></p>
<p class="MsoListParagraph" style="text-indent:-.25in;mso-list:l0 level1 lfo4"><![if !supportLists]><span style="color:#1F497D"><span style="mso-list:Ignore">2.<span style="font:7.0pt "Times New Roman"">
</span></span></span><![endif]><span style="color:#1F497D">Memstar http://memsstar.com/products-services/mems/vapor-HF-hydrogen-fluoride-vapor-phase-etching/<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">The Anhydrous vacuum systems are orders of magnitude more in terms of cost than the acid systems (although the acid systems require some sort of exhaust hood) but presumable give more selectivity, rate control
etc. I have only used the vacuum systems. The SPTS tool utilizes alcohol as catalyst and operates at higher pressures (Torr range) whereas the Memstar tool utilizes water vapor as a catalyst when required and operates at lower pressure (mTorr range).
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Thanks<o:p></o:p></span></p>
<div>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">Peter J Duda</span><span style="font-size:13.5pt;font-family:"Segoe UI",sans-serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">Technical Manager, Pritzker Nanofabrication Facility</span><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">Institute for Molecular Engineering</span><span style="font-size:13.5pt;font-family:"Segoe UI",sans-serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">University of Chicago</span><span style="font-size:13.5pt;font-family:"Segoe UI",sans-serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">5640 South Ellis Avenue<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">WERC LL181<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">Chicago, IL 60637</span><span style="font-size:13.5pt;font-family:"Segoe UI",sans-serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">Office: 773-702-8903<br>
Cell: 805-636-2323</span><span style="font-size:13.5pt;font-family:"Segoe UI",sans-serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">duda@uchicago.edu<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.0pt;color:#1F497D">ime.uchicago.edu</span><span style="font-size:13.5pt;font-family:"Segoe UI",sans-serif;color:black"><o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b>From:</b> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu]
<b>On Behalf Of </b>Morrison, Richard H., Jr.<br>
<b>Sent:</b> Thursday, December 03, 2015 12:21 PM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] HF vapor etch<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Hi Folks,<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">I am looking for a HF vapor release tool, I see that OAI and SPTS are the 2 manufactures out there, any recommendations or other suppliers?<o:p></o:p></p>
<p class="MsoNormal"><br>
thanks in advance<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Rick<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Draper <o:p></o:p></p>
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