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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Hi Jacob,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Indeed the EVG 620 is not as flexible as the Suss MA6 for instance. We do have an EVG620 and similarly to your case we have people
working with small samples and therefore we purchased a mask chuck with a 55mm dia opening allowing user to position the mask to the desired pattern. You need the chuck and the corresponding loading frame. In parallel you also need to have a sample chuck holder
for small pieces. We do have one for 2” (EVG said it works for small pieces) but due to the vacuum grooves working with 10x10 mm2 sample will not give you the best resolution as sample cannot be clamped with vacuum. Maybe EVG offers now more suitable chuck
for small pieces. <o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Along all these hardware tools you also need a software upgrade (service visit) to include these parts in the software. A rather expensive
upgrade.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Let me know if you need more details on this that we do it outside the labnetowrk.<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Kind regards,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Fouad Karouta<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">ANFF ACT Node Manager<o:p></o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu]
<b>On Behalf Of </b>Jacob Trevino<br>
<b>Sent:</b> Wednesday, 17 February 2016 1:06 AM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] Chips on a EVG 620<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif">Hello All,</span><o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif">At the CUNY ASRC NanoFab, we have a EVG 620 mask aligner with 6” and 4” wafer tooling. We have a number of users who need to process chips of varying sizes. In some cases, users need the flexibility
to move the chip across the mask. As I am sure you are familiar, many researchers have several chip layers across one photomask. </span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif">It seems as though EVG’s tooling options for chips are fairly limited with less flexibility than I have seen with SUSS chucks in the past. I am curious what other EVG mask aligner owners do
to accommodate users who need to perform lithography on chips. Have you made your own custom tooling? Any thoughts would be greatly appreciated. </span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif">Best regards,</span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif">Jacob</span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-size:13.5pt;font-family:"Calibri",sans-serif;color:black">-------------------------------- </span><span style="font-size:11.5pt;font-family:"Calibri",sans-serif;color:black"><o:p></o:p></span></p>
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<p class="MsoNormal"><b><i><span style="font-family:"Calibri",sans-serif;color:black">Jacob Trevino, PhD</span></i></b><span style="font-family:"Calibri",sans-serif;color:black"><br>
NanoFabrication Facility Director<br>
The City University of New York (CUNY)<br>
Advanced Science Research Center (ASRC)<br>
Tel. </span><a href="tel:%28212%29%20413-3310" target="_blank"><span style="font-family:"Calibri",sans-serif">(212) 413-3310</span></a><span style="color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif;color:black">Cel. </span><a href="tel:%28646%29%20629-1179" target="_blank"><span style="font-family:"Calibri",sans-serif">(646) 629-1179</span></a><span style="color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif;color:black">Email: </span><a href="mailto:Jacob.Trevino@asrc.cuny.edu" target="_blank"><span style="font-family:"Calibri",sans-serif">Jacob.Trevino@asrc.cuny.edu</span></a><span style="color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif;color:black">Web: </span><a href="http://asrc.cuny.edu/" target="_blank"><span style="font-family:"Calibri",sans-serif">http://asrc.cuny.edu/</span></a><span style="color:black"><o:p></o:p></span></p>
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