<div dir="ltr">We have a 620 but only use it for bond alignment. We do occasionally run into this on the our MA-6, our best recommendation is to put the process chip in the right spot on the chuck for the mask level they want to use and then put several other pieces of equal thickness around the chuck to even it out.<div><br></div><div>-Kevin</div></div><div class="gmail_extra"><br><div class="gmail_quote">On Wed, Feb 17, 2016 at 12:42 PM, Mark Giulio Chiappa <span dir="ltr"><<a href="mailto:mark.chiappa@ntnu.no" target="_blank">mark.chiappa@ntnu.no</a>></span> wrote:<br><blockquote class="gmail_quote" style="margin:0 0 0 .8ex;border-left:1px #ccc solid;padding-left:1ex">
<div dir="auto">
<div>Hi Jacob,</div>
<div><br>
</div>
<div>Here at NTNU NanoLab we have a solution. It's not very elegant but it is cheap, flexible and does work. We use low tac tape (I forget the brand but I can let you know if you want it) to cover the entire area of the vacuum chuck with a hole in it for where
the user wants to place their chip. That way the sample is held by system vacuum. The WEC works fine and we've had no complaints about the results. If your users are really pushing it and have their chip very close to the perimeter of the chuck it may be
smart to place a dummy chip or even two to avoid a bad WEC.</div>
<div><br>
</div>
<div>We use the same trick with our MA6. </div>
<div><br>
</div>
<div>Kind regards</div>
<div>Mark<br>
<br>
Sent from my iPhone</div><div><div class="h5">
<div><br>
On 16 Feb 2016, at 17:41, Jacob Trevino <<a href="mailto:Jacob.Trevino@asrc.cuny.edu" target="_blank">Jacob.Trevino@asrc.cuny.edu</a>> wrote:<br>
<br>
</div>
<blockquote type="cite">
<div>
<div>
<div>
<div>
<div><font face="Calibri,sans-serif">Hello All,</font></div>
<div><font face="Calibri,sans-serif"><br>
</font></div>
<div><font face="Calibri,sans-serif">At the CUNY ASRC NanoFab, we have a EVG 620 mask aligner with 6” and 4” wafer tooling. We have a number of users who need to process chips of varying sizes. In some cases, users need the flexibility to move the chip across
the mask. As I am sure you are familiar, many researchers have several chip layers across one photomask. </font></div>
<div><font face="Calibri,sans-serif"><br>
</font></div>
<div><font face="Calibri,sans-serif">It seems as though EVG’s tooling options for chips are fairly limited with less flexibility than I have seen with SUSS chucks in the past. I am curious what other EVG mask aligner owners do to accommodate users who need
to perform lithography on chips. Have you made your own custom tooling? Any thoughts would be greatly appreciated. </font></div>
<div><font face="Calibri,sans-serif"><br>
</font></div>
<div><font face="Calibri,sans-serif">Best regards,</font></div>
<div><font face="Calibri,sans-serif">Jacob</font></div>
</div>
<div style="color:rgb(0,0,0);font-family:Calibri,sans-serif;font-size:15px">
<br>
</div>
<div style="color:rgb(0,0,0);font-family:Calibri,sans-serif;font-size:15px">
<div>
<div><span style="font-size:medium"><br>
</span></div>
<div><span style="font-size:medium">-------------------------------- </span></div>
<div>
<div style="font-size:medium">
<p class="MsoNormal" style="margin:0in 0in 0.0001pt;font-family:'Times New Roman',serif">
<b><i><span style="font-family:Calibri,sans-serif">Jacob Trevino, PhD</span></i></b><span style="font-family:Calibri,sans-serif"><span><br>
NanoFabrication Facility Director<br>
The City University of New York (CUNY)<br>
Advanced Science Research Center (ASRC)<br>
</span>Tel. <a href="tel:%28212%29%20413-3310" value="+12124133310" target="_blank">(212) 413-3310</a><u></u><u></u></span></p>
<p class="MsoNormal" style="margin:0in 0in 0.0001pt;font-family:'Times New Roman',serif">
<span style="font-family:Calibri,sans-serif">Cel. <a href="tel:%28646%29%20629-1179" value="+16466291179" target="_blank">(646) 629-1179</a></span></p>
<p class="MsoNormal" style="margin:0in 0in 0.0001pt;font-family:'Times New Roman',serif">
<span style="font-family:Calibri,sans-serif">Email: <a href="mailto:Jacob.Trevino@asrc.cuny.edu" target="_blank">Jacob.Trevino@asrc.cuny.edu</a><u></u><u></u></span></p>
<p class="MsoNormal" style="margin:0in 0in 0.0001pt;font-family:'Times New Roman',serif">
<span style="font-family:Calibri,sans-serif">Web: <a href="http://asrc.cuny.edu/" target="_blank">http://asrc.cuny.edu/</a></span></p>
<div><br>
</div>
</div>
</div>
<div><br>
</div>
</div>
</div>
</div>
</div>
</div>
</blockquote>
</div></div><span class=""><blockquote type="cite">
<div><span>_______________________________________________</span><br>
<span>labnetwork mailing list</span><br>
<span><a href="mailto:labnetwork@mtl.mit.edu" target="_blank">labnetwork@mtl.mit.edu</a></span><br>
<span><a href="https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork" target="_blank">https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork</a></span><br>
</div>
</blockquote>
</span></div>
<br>_______________________________________________<br>
labnetwork mailing list<br>
<a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<a href="https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork" rel="noreferrer" target="_blank">https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork</a><br>
<br></blockquote></div><br><br clear="all"><div><br></div>-- <br><div class="gmail_signature"><div dir="ltr"><div><div dir="ltr"><div>Kevin Owen<div>Senior Engineer in Research</div><div>Operations Group, Lurie Nanofabrication Facility</div><div>University of Michigan</div><div>(734) 545-4014</div></div></div></div></div></div>
</div>