<html><head><meta http-equiv="Content-Type" content="text/html charset=utf-8"></head><body style="word-wrap: break-word; -webkit-nbsp-mode: space; -webkit-line-break: after-white-space;" class=""><div style="margin: 0px; line-height: normal;" class="">Greetings Friends and Neighbors,</div><div style="margin: 0px; line-height: normal; min-height: 14px;" class=""><br class=""></div><div style="margin: 0px; line-height: normal;" class="">i have a user here at the Washington Nanofabrication Facility desirous of etching NbSe2 in our Flourine ICP system. I am seeking info/experience/suggestions regarding this activity and Selenium with respect to hazards and equipment contamination concerns. There is some info in the literature about RIE of this material via CF4 but i’m not seeing anything regarding hazards to equipment (especially equipment geared to many different users and projects…) and personnel. </div><div style="margin: 0px; line-height: normal; min-height: 14px;" class=""><br class=""></div><div style="margin: 0px; line-height: normal;" class="">Probable etch products are SeF6 and NbF5(?)- The SeF6 appears to be a nasty actor but perhaps proper post-process pumping and purging (mmmm… alliteration!) would take care of that…. </div><div style="margin: 0px; line-height: normal; min-height: 14px;" class=""><br class=""></div><div style="margin: 0px; line-height: normal;" class="">Thank you so much for the help and guidance.</div><div style="margin: 0px; line-height: normal; min-height: 14px;" class=""><br class=""></div><div style="margin: 0px; line-height: normal;" class="">Best Regards</div><div style="margin: 0px; line-height: normal; min-height: 14px;" class=""><br class=""></div><div style="margin: 0px; line-height: normal;" class="">Mark</div><div class=""><br class=""></div><div class=""><br class=""></div><div class=""><br class=""></div><div class="">
<div class="">Mark D. Morgan<br class="">Research Engineer, Washington Nanofabrication Facility (WNF)<br class="">National Nanotechnology Coordinated Infrastructure (NNCI)<br class="">University of Washington<br class="">Fluke Hall 132, Box 352143<br class="">(206) 221-6349<br class=""><a href="mailto:mmorgan3@uw.edu" class="">mmorgan3@uw.edu</a><br class=""><a href="http://www.wnf.washington.edu/" class="">http://www.wnf.washington.edu/</a></div>
</div>
<br class=""></body></html>