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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Draper installed a new Rapier last summer. This our current process control on the ESC chuck:<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">3-6 sccm flow at 10 Torr
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">We clean the chamber with O2 plasma when the flow rate gets to 8- 10sccm at 10Torr pressure.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">If He flow does not reduce, we open chamber and clean the ESC chuck manually.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">We have very tight specs on cleaning the wafer backside to remove particles. Our tool is setup for either 100mm or 150mm wafer size.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Rick<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Draper
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Principal Member of the Technical Staff<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">555 Technology Square<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Cambridge Ma, 02139-3563<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">www.draper.com<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">rmorrison@draper.com<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">W 617-258-3420<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">C 508-930-3461<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu]
<b>On Behalf Of </b>Kevin Owen<br>
<b>Sent:</b> Monday, June 13, 2016 4:17 PM<br>
<b>To:</b> LaFleur, David W <dlafleur@cns.fas.harvard.edu><br>
<b>Cc:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> Re: [labnetwork] Pegasus - Rapier Esc question<o:p></o:p></span></p>
<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">We have 2 Pegasus systems, one 4" and one 6", and a 6" APS, all with 6kV esc's. Assuming the same software and recipe format, it's in the "leak check" step defined for each recipe. There should be a warning level and a fault level. Ours
is set for 125 mTorr/min warning, 150 mTorr/min fault. On the APS, it's higher (200 mTorr/min fault), since that chuck is older and more worn and we don't get as good leak checks on it. It doesn't really affect process as long as the chuck and wafer are clean
so you are getting consistent results wafer-to-wafer.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">We typically run 10 Torr backside pressure, most recipes are either 10C or 20C (although temperature doesn't really seem to matter for this). With brand new, shiny ESCs, we've seen anywhere from 10-40 mTorr/min. Leak rates then slowly increase
over time as the chucks wear. With proper care, they seem to last a few years before it gets uncomfortably high (to me, uncomfortable is ~150 mTorr/min) and we replace them. Currently, both Pegasus tools are somewhere in the 40-70 mTorr/min range, and the
APS is at 100-120.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">I'd say the biggest factor that will affect this is the cleanliness of the back of the wafer. Many years ago, when our tools were still new, we would have very regular (probably once per day) leak check failures due to particulate on the
back of their samples. What sort of leak rates are you seeing? What's your chamber leak rate?<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">-Kevin<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">On Mon, Jun 13, 2016 at 2:03 PM, LaFleur, David W <<a href="mailto:dlafleur@cns.fas.harvard.edu" target="_blank">dlafleur@cns.fas.harvard.edu</a>> wrote:<o:p></o:p></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:black">To Engineers who maintain Pegasus – Rapier Systems with Esc<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:black">Where do you set your 15 Torr leak up rate pass/fail limit for the Esc. Does anyone have success in achieving the factory spec of 50mt/min on a 150mm chuck for
15 torr @15degC ?<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:black">What is your max flow you like to see for 15 Torr?<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:black">Thanks in advance.<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:black">David LaFleur<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:black">Equipment Engineer<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:black">Harvard University<o:p></o:p></span></p>
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<p class="MsoNormal" style="margin-bottom:12.0pt"><br>
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<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">-- <o:p></o:p></p>
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<p class="MsoNormal">Kevin Owen<o:p></o:p></p>
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<p class="MsoNormal">Senior Engineer in Research<o:p></o:p></p>
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<p class="MsoNormal">Operations Group, Lurie Nanofabrication Facility<o:p></o:p></p>
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<p class="MsoNormal">University of Michigan<o:p></o:p></p>
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<p class="MsoNormal">(734) 545-4014<o:p></o:p></p>
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