<html><head><meta http-equiv="Content-Type" content="text/html charset=utf-8"></head><body style="word-wrap: break-word; -webkit-nbsp-mode: space; -webkit-line-break: after-white-space;" class="">Aaron,<div class=""><br class=""></div><div class="">We have a rather high power density oxygen barrel asher that removes Bosch polymer. If you cross-section a test device, there’s an observable difference in SEM sidewall charging pre- and post barrel ashing. You may also note the change in polymer mushrooming at the tops of features. Definitely, use low keV SEM imaging. </div><div class=""><br class=""></div><div class="">It’s been our experience that oxide will not burn off during furnace oxidation; rather, O2 will diffuse through the remaining carbonized layer.</div><div class=""><br class=""></div><div class="">Wet process alternative: EKC 265 from DuPont. <a href="http://www.dupont.com/content/dam/dupont/products-and-services/electronic-and-electrical-materials/documents/ekc/EKC265.pdf" class="">http://www.dupont.com/content/dam/dupont/products-and-services/electronic-and-electrical-materials/documents/ekc/EKC265.pdf</a></div><div class=""><br class=""><div class="">
<div>Best of Luck,</div><div>Noah</div><div><br class=""></div><div><i class="">Noah Clay</i></div><div><i class="">Director, Quattrone Nanofabrication Facility</i></div><div><i class="">School of Engineering & Applied Science</i></div><div><i class="">University of Pennsylvania</i></div><div><i class="">Philadelphia, PA</i></div><div><i class=""><br class=""></i></div><div><i class="">(215) 898-9308</i></div><div><i class=""><a href="mailto:nclay@upenn.edu" class="">nclay@upenn.edu</a></i></div><div><a href="https://www.linkedin.com/in/noah-clay-5073b3?trk=hp-identity-name" class="">LinkedIn Profile</a></div>
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<br class=""><div><blockquote type="cite" class=""><div class="">On Aug 3, 2016, at 2:34 PM, Aaron Hryciw <<a href="mailto:ahryciw@ualberta.ca" class="">ahryciw@ualberta.ca</a>> wrote:</div><br class="Apple-interchange-newline"><div class=""><div dir="ltr" class=""><div class="">Dear colleagues,</div><div class=""><br class=""></div><div class=""><div class="">Our facility recently installed a Tystar wet/dry oxidation tube, which has so far only been used to oxidise virgin Si wafers. Recently, one of our users has requested to do a 400–1000 nm wet oxidation at 1100 °C on DRIE (Bosch) etched Si wafers which still have DRIE passivation polymer on them, for the dual purpose of removing the polymer and growing an oxide. </div><div class=""><br class=""></div><div class="">Given the tool's excellent performance so far, I am concerned with the possibility of contaminating the (atmospheric) tube as the polymer is burned off, adversely affecting subsequent processes. My priority is to protect the integrity of the tool, but I also do not want to be needlessly restrictive if the presence of the polymer does not in fact pose any problem. We are a multi-user facility, with academic and industrial users who primarily do MEMS and microfluidics work (i.e., no CMOS processing).</div><div class=""><br class=""></div><div class="">My initial thought would be to have this user remove the polymer first using a dry etch (O₂ plasma), only oxidising the wafers once it has been verified that the polymer is no longer present.</div><div class=""><br class=""></div><div class="">Any advice on this matter would be greatly appreciated. Many thanks.</div><div class=""><br class=""></div><div class="">Cheers, </div><div class=""> </div><div class=""> – Aaron Hryciw</div></div><div class=""><br class=""></div><br clear="all" class=""><div class=""><div class="gmail_signature"><div dir="ltr" class=""><div class=""><div dir="ltr" class=""><div class=""><div dir="ltr" class=""><div class=""><div dir="ltr" class=""><div dir="ltr" class=""><div dir="ltr" class=""><div class=""><u style="font-size:x-small" class=""> </u><span style="font-size:x-small" class=""> </span><br class=""></div><div class=""><span style="font-size:12.8px" class=""><font size="1" class=""><div style="line-height: 1.38; margin-top: 0pt; margin-bottom: 0pt;" class=""><span style="font-family: arial; white-space: pre-wrap; line-height: 1.38; background-color: transparent;" class="">Aaron Hryciw, PhD, PEng</span></div><div style="line-height: 1.38; margin-top: 0pt; margin-bottom: 0pt;" class=""><span style="font-family: arial; white-space: pre-wrap; line-height: 1.38; background-color: transparent;" class="">Fabrication Group Manager</span><br class=""></div><div style="line-height: 1.38; margin-top: 0pt; margin-bottom: 0pt;" class=""><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class="">University of Alberta - nanoFAB</span></div><div style="line-height: 1.38; margin-top: 0pt; margin-bottom: 0pt;" class=""><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class="">W1-060 ECERF Building</span></div><div style="line-height: 1.38; margin-top: 0pt; margin-bottom: 0pt;" class=""><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class="">9107 - 116 Street</span></div><div style="line-height: 1.38; margin-top: 0pt; margin-bottom: 0pt;" class=""><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class="">Edmonton, Alberta</span></div><div style="line-height: 1.38; margin-top: 0pt; margin-bottom: 0pt;" class=""><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class="">Canada T6G 2V4 </span><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class=""> </span><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class=""> </span><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class="">Ph: 780-940-7938</span></div><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class=""><a href="http://www.nanofab.ualberta.ca/" style="color:rgb(17,85,204)" target="_blank" class="">www.nanofab.ualberta.ca</a></span><span style="font-family: arial; vertical-align: baseline; white-space: pre-wrap; background-color: transparent;" class=""> </span></font></span><font class=""><br class=""></font><br class=""></div></div></div></div></div></div></div></div></div></div></div></div>
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