<html><head><meta http-equiv="Content-Type" content="text/html charset=utf-8"></head><body style="word-wrap: break-word; -webkit-nbsp-mode: space; -webkit-line-break: after-white-space;" class="">Hi All,<div class=""><br class=""></div><div class="">We have a DC magnetron sputtering system using 2” diameter targets. We’ve been observing many shorts due to severe flaking. The student is using a recipe developed by her predecessor which uses 100W of DC power and 5 mTorr of Ar. Does anyone know what steps should be taken to avoid/reduce flaking when DC sputtering ITO? I suspect that the student is using too much power.</div><div class=""><br class=""></div><div class="">Thanks,</div><div class=""><span style="orphans: 2; text-align: -webkit-auto; widows: 2;" class="">Long Chang</span></div><div class=""><div style="color: rgb(0, 0, 0); font-family: Helvetica; font-style: normal; font-variant: normal; font-weight: normal; letter-spacing: normal; line-height: normal; orphans: 2; text-align: -webkit-auto; text-indent: 0px; text-transform: none; white-space: normal; widows: 2; word-spacing: 0px; -webkit-text-size-adjust: auto; -webkit-text-stroke-width: 0px; word-wrap: break-word; -webkit-nbsp-mode: space; -webkit-line-break: after-white-space; " class=""><div class=""><div class="">Nanofab Manager</div><div class=""><div class="">University of Houston</div><div class="">3605 Cullen Blvd, Entrance 14</div><div class="">Room E1007A, SERC Bldg 545</div><div class="">Houston, TX 77204-5062</div></div></div><div class=""><img apple-inline="yes" id="46FDA233-6EB1-4463-8ED1-578F3C798D73" height="640" width="480" apple-width="yes" apple-height="yes" src="cid:3086A57B-3DB1-4B85-8710-71DBF15B4CB1@uh.edu" class=""></div></div><br class="Apple-interchange-newline"><br class="Apple-interchange-newline">
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