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Hi Michael,<br>
<br>
Please see below for a summary of hat I have:<br>
-I run all hazardous gases (3 or more on the fire diamond) in
coaxial lines; both the inner and outer tube are 316L SS. <br>
-The coaxial lines do not use any preformed directional changes;
both the inner and outer tubes are welded; the bend radius is 10
diameters.<br>
-The coaxial space is either under vacuum or pressure (on the lines
I warm up) and the vacuum/pressure is monitored; any change leads to
valve closure and notifications.<br>
-The only hazardous gas cylinder I have in the cleanroom is BCl3
because I wanted it close to the etcher; I may put future low vapor
pressure hazardous cylinders in the cleanroom. I warm up the line
that runs from the gas cabinet to the etcher. I also warm up the
cylinder and the manifold inside the gas cabinet.<br>
-I do not have a pressure regulator in the BCl3 cabinet.<br>
-All my gas cabinets are single-panel, dual output; I am using only
one output for now.<br>
-I use 4-stick VMBs (except for BCl3; the cabinet is connected
directly to the etcher).<br>
-I have a Gas Room that houses the corrosive gas cabinets and some
"non-hazardous" cylinders outside of gas cabinets; the space is
monitored for O2 concentration.<br>
-I have a Bunker that houses the flammable and pyrophoric gases in
cabinets; any future GeH4, PH3, B2H6 will go in there; the space is
monitored for O2 concentration.<br>
-The exhaust from the gas cabinets and VMBs is sampled for hazardous
gases.<br>
-The flammable gas cabinets and VMBs have UV/IR sensors that get
power from and report to the Fire Alarm System (FAS). The FAS is
connected to the TGMS and the TGMS can close valves in the gas
cabinets, VMBs, and tools.<br>
-All gas cabinets and VMBs are sprinklered.<br>
-My C4F8 panel has two outputs; one is currently used and one is for
the future. They tee off downstream of the pressure regulator.<br>
<br>
I hope this helps and I wish you the best of luck,<br>
<br>
Iulian<br>
<br>
<pre class="moz-signature" cols="72">iulian Codreanu, Ph.D.
Director of Operations, UD NanoFab
163 ISE Lab
221 Academy Street
Newark, DE 19716
302-831-2784
<a class="moz-txt-link-freetext" href="http://udnf.udel.edu">http://udnf.udel.edu</a></pre>
<div class="moz-cite-prefix">On 12/6/2016 10:17 AM, Michael Khbeis
wrote:<br>
</div>
<blockquote cite="mid:9AF8CF08-9768-43F7-ADE5-FC90B73E2207@uw.edu"
type="cite">
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<div>Dear Colleagues,</div>
<div><br>
</div>
<div>Once again, I am pitted against my capital projects group.
This time regarding HPM gas infrastructure. Thanks to your prior
input, we were able to obtain a proper toxic gas monitoring
system. However, now I am in a code interpretation debate with
their process piping consultants on the use of VMBs for
multi-tool feeds and coaxial lines. They don't want either in
our project. They specified hastelloy for Chlorine and BCl3 but
single walled 316ss (after much debate that 304 was not
sufficient) for all our other gasses. In ALL my prior sites we
always used coaxial lines as a secondary containment for HPMs,
but currently this project has no coax specified. </div>
<div><br>
</div>
<div>I am also in debate on whether or not 100% hydrogen (large
330cf cylinders) can be in the Cleanroom without a cabinet vs a
bunker in a cabinet. Their interpretation is that an H-5
facility can store 9000cf; however, I believe they are ignoring
the vented enclosure requirements. </div>
<div><br>
</div>
<div>We will have the following HPM gasses:</div>
<div>100% Silane</div>
<div>100% Hydrogen</div>
<div>Ammonia</div>
<div>Chlorine</div>
<div>Boron Trichloride</div>
<div>Phosphine</div>
<div>Diborane</div>
<div><br>
</div>
<div>Can you please weigh in on your sites use of:</div>
<div><br>
</div>
<div>1) coaxial lines, which gasses and if any HPMs are excluded
or use single hastelloy </div>
<div><br>
</div>
<div>2) use of valve manifold boxes / vented enclosures for
distributing HPMs to multiple tools (or anywhere else there's a
mechanical connection)</div>
<div><br>
</div>
<div>3) location and enclosure or not for 100% hydrogen</div>
<div><br>
</div>
<div>And on a non-safety related note, we asked for panels with
multi-stick feeds to each tool; however, the process piping
designer just teed all of our lines from a single point and put
a regulator at each tool instead to "save money". I am very
concerned about LP gasses (e.g C4F8) being starved when multiple
tools are running. We distinctly had issues with past lab with
shared C4F8 bottles. Their recommendation is to ONLY heat the
cylinder to increase vapor pressure, but given my limited
knowledge, I believe with high flow rate and lacking heating of
the panel and lines we will have gas condensation issues. To
date, my input is still being dismissed so please state:</div>
<div><br>
</div>
<div>4) how you handle LP gas distribution to multiple tools </div>
<div><br>
</div>
<div>I thank you so much for taking the time out of your busy
schedules to provide this input. This community/forum has been
such a blessing. </div>
<div><br>
</div>
<div>Most gratefully,</div>
<div><br>
<div>
<div><span style="background-color: rgba(255, 255, 255, 0);">Dr.
Michael Khbeis</span>
<div><span style="background-color: rgba(255, 255, 255, 0);">Washington
Nanofab Facility<br>
University of Washington<br>
Fluke Hall, Box 352143<br>
(O) <a moz-do-not-send="true" href="tel:206.543.5101"
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</div>
</div>
</div>
<br>
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