<div dir="ltr">Richard,<div><br></div><div>At the University of Michigan LNF we have 19 furnaces that can handle up to 150mm including P-type insitu doped poly. Our p-type poly is doped with boron.<div><br></div><div>We have only characterized insitu p-type for 100mm but have not had a request for 150mm so it is not characterized. Can you give me some more information as to what you need? Starting material? Processing done before this deposition?</div><div>I would be happy to send you the data we have for 4" if you are interested.</div><div><br></div><div>Rob</div></div></div><div class="gmail_extra"><br><div class="gmail_quote">On Thu, Jan 26, 2017 at 6:26 AM, Morrison, Richard H., Jr. <span dir="ltr"><<a href="mailto:rmorrison@draper.com" target="_blank">rmorrison@draper.com</a>></span> wrote:<br><blockquote class="gmail_quote" style="margin:0 0 0 .8ex;border-left:1px #ccc solid;padding-left:1ex">
<div lang="EN-US" link="#0563C1" vlink="#954F72">
<div class="m_-7549555495246170590WordSection1">
<p class="MsoNormal">Hi Everyone,<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">I have the need to deposit In-Situ doped P-Type Polysilicon. Do any of you run that process, is so what feed gas is commonly used?<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">I understand that In-Situ doped N-Type poly uses P or As mixed with Silane in the same cylinder is that correct?<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Do any of you offer P-Type In-Situ doped polysilicon for 150mm wafers?<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Thanks<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Rick<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Richard H. Morrison<u></u><u></u></p>
<p class="MsoNormal">Principal Member of the Technical Staff<u></u><u></u></p>
<p class="MsoNormal">Draper<u></u><u></u></p>
<p class="MsoNormal">555 Technology Square<u></u><u></u></p>
<p class="MsoNormal">Cambridge, MA<u></u><u></u></p>
<p class="MsoNormal">02139-3573<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Work <a href="tel:(617)%20258-3420" value="+16172583420" target="_blank">617-258-3420</a><u></u><u></u></p>
<p class="MsoNormal">Cell <a href="tel:(508)%20930-3461" value="+15089303461" target="_blank">508-930-3461</a><u></u><u></u></p>
<p class="MsoNormal"><a href="http://www.draper.com" target="_blank">www.draper.com</a><u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
</div>
<hr>
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately
destroy all copies of this email.
<hr>
</div>
<br>______________________________<wbr>_________________<br>
labnetwork mailing list<br>
<a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<a href="https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork" rel="noreferrer" target="_blank">https://www-mtl.mit.edu/<wbr>mailman/listinfo.cgi/<wbr>labnetwork</a><br>
<br></blockquote></div><br><br clear="all"><div><br></div>-- <br><div class="gmail_signature" data-smartmail="gmail_signature"><div dir="ltr"><div><div dir="ltr"><div dir="ltr">Robert W. Hower, Ph.D.<div>The University of Michigan, Lurie Nanofabrication Facility</div><div>1301 Beal Ave, 1234A EECS</div><div>Ann Arbor, MI 48109</div><div>734-827-4370</div></div></div></div></div></div>
</div>