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<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">HI Esta,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">We were in exactly the same position in the summer, our requirements also included that we wanted a system that could easily combined with our EBL for mix ‘n’ match. From
the literature it was not easy to determine which system fulfilled our requirements best the µPG or the MLA100. Myself and our process engineer visited Heidelberg at their HQ to see the systems.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">We took wafers exposed on our EBL system as we wanted to see how easily and accurately the HIMT systems aligned to our wafers.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">The µPG was quite difficult as the field of view on the alignment camera was so small that it took the HIMT engineer a long time to find the mark. We also found out that
to expose a full wafer or even a sparse pattern over a large area would be very time consuming.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">We ruled this system out quite quickly due to.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">Having to change write heads,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">Not a very easy system to align on (this was based on our user base)<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">Slow exposures.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">The MLA 100 is the system we spent most of the day on. The alignment is much easier as the system has an overview camera.
<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">The exposure was much faster. The alignment was good on both etched and metal marks.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">While there we had a tour of the facility and they showed us the MLA150. This system is roughly 10X faster than the MLA100 with better alignment specs.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">We ended up buying the MLA150 with is currently being installed in our cleanroom. It’s available with 2 lasers 405nm and 375nm. Backside alignment and greyscale are also
options. Of course it’s at a different price point.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">I hope this helps. If you need more feel free to contact me.</span><o:p></o:p></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">Kind regards<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US">Mark
<o:p></o:p></span></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><span lang="EN-US" style="font-family:"Lucida Calligraphy"">Mark Chiappa<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Senior Engineer<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">NTNU NanoLab<o:p></o:p></span></p>
<p class="MsoNormal">Sem Sælandvei 14<o:p></o:p></p>
<p class="MsoNormal">7491 Trondheim<o:p></o:p></p>
<p class="MsoNormal">Norway<o:p></o:p></p>
<p class="MsoNormal">+47 918 97 617<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US">From:</span></b><span lang="EN-US"> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu]
<b>On Behalf Of </b>Abelev, Esta<br>
<b>Sent:</b> Tuesday, February 14, 2017 7:14 PM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] Heidelberg Direct Write tool<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Good Afternoon,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Our facility is looking to purchase Direct Laser Write tool, based on the budget we are looking on two options microPG101 or MLA100.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">We did not have those capabilities before therefore it is hard to access at this point of time if the main work load on the tool will be on a direct wafer write or mask making.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">I would like to ask for a feedback/comments on those two systems: operation/maintenance/how user friendly/ and configuration, specially, if somebody have experience with MLA100 system.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Thank you in advance, Esta<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:9.0pt;font-family:Atlanta">-----------------------</span><span lang="EN-US"><o:p></o:p></span></p>
<p class="MsoNormal"><b><span lang="EN-US" style="font-size:9.0pt;font-family:Atlanta">Esta Abelev, PhD</span></b><span lang="EN-US"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:9.0pt;font-family:Atlanta">Technical Director,<i> </i>Petersen Institute of NanoScience and Engineering </span><span lang="EN-US"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:9.0pt;font-family:Atlanta">University of Pittsburgh | 3700 O’Hara Street | 636| Pittsburgh, PA 15261</span><span lang="EN-US"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:9.0pt;font-family:Atlanta">412-383-4096 | <a href="mailto:eabelev@pitt.edu"><span style="color:#0066CC;text-decoration:none">eabelev@pitt.edu</span></a> | <a href="https://na01.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.nano.pitt.edu%2F&data=01%7C01%7Ceabelev%40pitt.edu%7C9f5bd58ba84940765cf308d4024fbe18%7C9ef9f489e0a04eeb87cc3a526112fd0d%7C1&sdata=3KfbG5VbshqdoIAPxvX%2F2s1UeU7ultmBoZmm%2FaZ2Itc%3D&reserved=0"><span style="color:purple;text-decoration:none">nano.pitt.edu</span></a></span><span lang="EN-US"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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