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<p class="MsoNormal">Hi everyone, two of our users are interested in sputtering a material that we are not familiar with, any info or insight you could provide would be very much appreciated<o:p></o:p></p>
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<p class="MsoNormal"><b>Vanadium oxide (VO2)</b> – for deposition in our “clean” sputter tool. Base pressures in the low 10-7 or high 10-8 torr range and a very restricted approved materials list. Currently the instrument is used to reactive sputter high quality
AlN films with good piezoelectric properties. We are concerned that flaking oxide may contaminate the reactive process.
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<p class="MsoNormal">Also, we have been advised that vanadium oxide targets will be a mixture of oxides (VO, VO2, VO3, V2O5). Despite starting with a pure powder the temperature and pressure of the fabrication process will produce other oxides)<o:p></o:p></p>
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<p class="MsoNormal">Thanks for your help<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">jim<o:p></o:p></p>
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