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Hello Aji;<br>
<br>
We etch ALD Alumina film with our Oxford system which is patterned
by resist.<br>
Since most our films are thin we do not have much problem with
selectivity to resist <br>
which is about 1:1 for those films.<br>
<br>
The recipe we use is:<br>
BCl3 30 sccm<br>
ICP 625 W<br>
RF 50 W<br>
2 mtorr<br>
<br>
We get ~ 650 Ang/ min rate for both the Alumina film and resist. The
recipe has not <br>
been optimized but should be. One of the items that we should work
on is to have <br>
the recipe etch slower. Our users have said it etches too fast. We
have since looked at <br>
reducing the RF platten /chuck power while keeping the ICP power the
same and this <br>
helps in lowering the etch rate.<br>
<br>
Regards, Tony W.<br>
<br>
<br>
<div class="moz-cite-prefix">On 4/18/2017 9:54 AM, Jugessur, Aju S
wrote:<br>
</div>
<blockquote cite="mid:D51B8E60.D872%25aju-jugessur@uiowa.edu"
type="cite">
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<div>Hi,</div>
<div><br>
</div>
<div>Can anyone offer some advice on Alumina etch?</div>
<div><br>
</div>
<div>We do have BCl3/Cl2/O2 etch on our Oxford PlasmaPro.</div>
<div>
<div>We plan to use S1818 as the mask as we intend etching less
than 30 nm of the Alumina: will this work? I am not sure what
is the etch selectivity.</div>
<div>We may also use an intermediate metal mask. I am aware that
ChF3 and C4F8 also etches Alumina.</div>
<div><br>
</div>
<div>Can anyone advise us on this process and a benchmark recipe
will help?</div>
<div><br>
</div>
<div>Also, the tool is currently used for III-V etching. Can we
safely use the tool to etch Alumina without the risk of
process contamination, assuming we do a clean up step each
time?</div>
</div>
<div><br>
</div>
<div>Thanks</div>
<div>Regards</div>
<div>Aju</div>
<div><br>
</div>
<div><br>
</div>
<div><br>
</div>
<div>
<div style="font-family: Helvetica; font-size: 12px; orphans: 2;
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<font class="Apple-style-span" face="Georgia" color="#103ffb"
size="2">Aju Jugessur <i>Ph.D.</i><br>
Director, University of Iowa Microfabrication Facility<br>
</font></div>
<div style="font-family: Helvetica; font-size: 12px; orphans: 2;
widows: 2; word-wrap: break-word; -webkit-nbsp-mode: space;
-webkit-line-break: after-white-space;">
<font class="Apple-style-span" face="Georgia" color="#103ffb"
size="2">Professor (Adj.), Physics and Astronomy<br>
OSTC, Iowa Advanced Technology Labs<br>
University of Iowa</font></div>
<div style="font-family: Helvetica; font-size: 12px; orphans: 2;
widows: 2; word-wrap: break-word; -webkit-nbsp-mode: space;
-webkit-line-break: after-white-space;">
<font class="Apple-style-span" face="Georgia" color="#103ffb"
size="2"><br>
</font></div>
<div style="font-family: Helvetica; font-size: 12px; orphans: 2;
widows: 2; word-wrap: break-word; -webkit-nbsp-mode: space;
-webkit-line-break: after-white-space;">
<font class="Apple-style-span" face="Georgia" color="#103ffb"
size="2">205 N. Madison St</font></div>
<div style="font-family: Helvetica; font-size: 12px; orphans: 2;
widows: 2; word-wrap: break-word; -webkit-nbsp-mode: space;
-webkit-line-break: after-white-space;">
<font class="Apple-style-span" face="Georgia" color="#103ffb"
size="2">Iowa City, IA 52242<br>
319 -353-2342 <br>
<a class="moz-txt-link-abbreviated" href="mailto:aju-jugessur@uiowa.edu">aju-jugessur@uiowa.edu</a><br>
<a class="moz-txt-link-freetext" href="http://ostc.uiowa.edu/uimf">http://ostc.uiowa.edu/uimf</a></font></div>
</div>
<div><br>
</div>
<br>
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