<div dir="ltr"><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">Dear Aju,</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">I had used the ALD Al2O3 long back. Here is the recipe I used in Plasmalab 100 OPT tool: </div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"><p class="MsoNormal" style="margin-left:28.35pt"> BCl<sub>3</sub> 50
sccm <span></span></p>
<p class="MsoNormal" style="margin-left:28.35pt"> Pressure 2mT<span></span></p>
<p class="MsoNormal" style="margin-left:28.35pt"> ICP Power 1250
W<span></span></p>
<p class="MsoNormal" style="margin-left:28.35pt"> Electrode 300 W<span></span></p>
<p class="MsoNormal" style="margin-left:28.35pt"> Temperature 10°C <span></span></p>
<p class="MsoNormal" style="margin-left:28.35pt"> Backside He 15 Torr<span></span></p>
<p class="MsoNormal" style="margin-left:28.35pt"><span> </span></p>
<p class="MsoNormal" style="margin-left:28.35pt">Etch Rate: 36-38 nm/min<span></span></p>
<p class="MsoNormal" style="margin-left:28.35pt">Selectivity to PR: ~ 0.4:1 </p><p class="MsoNormal" style="margin-left:28.35pt"><br></p><p class="MsoNormal" style="margin-left:28.35pt">PR I used was AZ5214E for which selectivity was average, so I had used the thick AZ4562 which has very good selectivity. </p><p class="MsoNormal" style="margin-left:28.35pt"><br></p><p class="MsoNormal" style="margin-left:28.35pt">In your case as the Alumina is only 30 nm, S1813 may survive. You may want try spinning at slightly lower rpm (~3K). </p><p class="MsoNormal" style="margin-left:28.35pt"><br></p><p class="MsoNormal" style="margin-left:28.35pt">Hope it helps. <br></p><p class="MsoNormal" style="margin-left:28.35pt"><br></p><p class="MsoNormal" style="margin-left:28.35pt">Thanks & best regards,</p><p class="MsoNormal" style="margin-left:28.35pt">vamsi</p><p class="MsoNormal" style="margin-left:28.35pt"><br></p></div><div class="gmail_extra"><br><div class="gmail_quote">On Tue, Apr 18, 2017 at 8:24 PM, Jugessur, Aju S <span dir="ltr"><<a href="mailto:aju-jugessur@uiowa.edu" target="_blank">aju-jugessur@uiowa.edu</a>></span> wrote:<br><blockquote class="gmail_quote" style="margin:0 0 0 .8ex;border-left:1px #ccc solid;padding-left:1ex">
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<div>Hi,</div>
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<div>Can anyone offer some advice on Alumina etch?</div>
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<div>We do have BCl3/Cl2/O2 etch on our Oxford PlasmaPro.</div>
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<div>We plan to use S1818 as the mask as we intend etching less than 30 nm of the Alumina: will this work? I am not sure what is the etch selectivity.</div>
<div>We may also use an intermediate metal mask. I am aware that ChF3 and C4F8 also etches Alumina.</div>
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<div>Can anyone advise us on this process and a benchmark recipe will help?</div>
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<div>Also, the tool is currently used for III-V etching. Can we safely use the tool to etch Alumina without the risk of process contamination, assuming we do a clean up step each time?</div>
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<div>Thanks</div>
<div>Regards</div>
<div>Aju</div>
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<font class="m_-7655298566853020660Apple-style-span" color="#103ffb" face="Georgia" size="2">Aju Jugessur <i>Ph.D.</i><br>
Director, University of Iowa Microfabrication Facility<br>
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<font class="m_-7655298566853020660Apple-style-span" color="#103ffb" face="Georgia" size="2">Professor (Adj.), Physics and Astronomy<br>
OSTC, Iowa Advanced Technology Labs<br>
University of Iowa</font></div>
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<font class="m_-7655298566853020660Apple-style-span" color="#103ffb" face="Georgia" size="2">205 N. Madison St</font></div>
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<font class="m_-7655298566853020660Apple-style-span" color="#103ffb" face="Georgia" size="2">Iowa City, IA 52242<br>
<a href="tel:03193%20532%20342" value="+913193532342" target="_blank">319 -353-2342</a> <br>
<a href="mailto:aju-jugessur@uiowa.edu" target="_blank">aju-jugessur@uiowa.edu</a><br>
<a href="http://ostc.uiowa.edu/uimf" target="_blank">http://ostc.uiowa.edu/uimf</a></font></div>
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<br></blockquote></div><br><br clear="all"><div><br></div>-- <br><div class="gmail_signature" data-smartmail="gmail_signature"><div dir="ltr"><div><div dir="ltr"><div><div dir="ltr"><font style="font-family:verdana,sans-serif;color:rgb(0,0,102)" size="2"><span style="color:rgb(102,102,102)">--<br>Thanks & Best Regards,<br>-----------------<br><b>N.P.Vamsi Krishna</b></span><br><span>Center for Nano Science and Engineering (CeNSE),<br>Indian Institute of Science(IISc), Banga<font size="2">lore.</font><br><font size="2">INDIA</font></span>-</font><font style="font-family:verdana,sans-serif;color:rgb(0,0,102)" size="2"><span>560012</span></font><br><br style="font-family:verdana,sans-serif"><h1 style="margin:0px 0px 15px;color:rgb(24,24,24);font-weight:normal;padding:0px;font-size:14px;font-family:Georgia,'Times New Roman',serif;line-height:18px">“Educating the mind without educating the heart is no education at all.” -Aristotle</h1></div></div></div></div></div></div>
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